Growth and characterization of thick cBN coatings on silicon and tool substrates

Thin Solid Films

Volumn 469-470, Issue SPEC. ISS., 2004, Pages 86-91

  Bewilogua, K ^a   Keunecke, M ^a   Weigel, K ^a   Wiemann, E ^b  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

^b TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

Author keywords

Cubic boron nitride; Cutting tools; Mechanical properties; Sputter deposition; Turning tests

Indexed keywords

CARBIDES; COMPRESSIVE STRESS; CUTTING TOOLS; FILM GROWTH; NUCLEATION; PHYSICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; THERMODYNAMIC STABILITY; THICKNESS MEASUREMENT; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

CBN; ELECTRON PROBE MICROANALYSIS (EPMA); PLASMA-ASSISTED CHEMICAL VAPOR DEPOSITION (PACVD); TURNING TESTS;

CUBIC BORON NITRIDE;

EID: 10044272003     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.08.061     Document Type: Article

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