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Volumn 14, Issue 9, 2005, Pages 1474-1481

Microstructure of the intermediate turbostratic boron nitride layer

Author keywords

Cubic boron nitride films; Morphology; Temperature dependence; Turbostratic interlayer

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPRESSIVE STRESS; EPITAXIAL GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HIGH TEMPERATURE EFFECTS; MORPHOLOGY; NUCLEATION; PHYSICAL VAPOR DEPOSITION; SILICON WAFERS; THERMAL CONDUCTIVITY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 21344456716     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.03.002     Document Type: Article
Times cited : (38)

References (37)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.