SCOPUS 정보 검색 플랫폼

Advanced Materials

Volumn 21, Issue 47, 2009, Pages 4769-4792

Block copolymer nanolithography: Translation of molecular level control to nanoscale patterns

(5) Bang, Joona c Jeong, Unyong d Ryu, Du Yeol d Russell, Thomas P b,f J Hawker, Craig a,e

a UNIVERSITY OF CALIFORNIA (United States)

b UNIVERSITY OF MASSACHUSETTS (United States)

c Korea University (South Korea)

d Yonsei University (South Korea)

e Material Corrosion and Inspection Group (United States)

f Materials Research Science and Engineering Center (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MOLECULAR LEVEL CONTROL; NANO-SCALE PATTERNS;

COPOLYMERIZATION; NANOSTRUCTURED MATERIALS;

BLOCK COPOLYMERS;

EID: 73949116174 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/adma.200803302 Document Type: Review

Times cited : (655)

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