Symmetric diblock copolymer thin films confined between homogeneous and patterned surfaces: Simulations and theory

Journal of Chemical Physics

Volumn 112, Issue 22, 2000, Pages 9996-10010

  Wang, Qiang ^a   Nath, Shyamal K ^a,b   Graham, Michael D ^a   Nealey, Paul F ^a   De Pablo, Juan J ^a  

^a University of Wisconsin Madison ^*  (United States)

^b ACCELRYS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; COMPUTER SIMULATION; CRYSTAL MICROSTRUCTURE; CRYSTAL SYMMETRY; MATHEMATICAL MODELS; MONTE CARLO METHODS; PHASE DIAGRAMS; SURFACE PHENOMENA; THIN FILMS;

PHENOMENOLOGICAL THEORY;

PLASTIC FILMS;

EID: 0033684418     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.481635     Document Type: Article

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