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Volumn 14, Issue 18, 2002, Pages 1290-1294

Optimization of diblock copolymer thin film self assembly

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BLOCK COPOLYMERS; GLASS TRANSITION; MOLECULAR WEIGHT; ORDER DISORDER TRANSITIONS; PLASTIC FILMS; POLYMETHYL METHACRYLATES; POLYSTYRENES; PORE SIZE; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY; THERMAL EFFECTS; VISCOSITY;

EID: 0037120344     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-4095(20020916)14:18<1290::AID-ADMA1290>3.0.CO;2-N     Document Type: Article
Times cited : (179)

References (28)
  • 14
    • 0010654024 scopus 로고    scopus 로고
    • Random copolymer synthesized by C.J. Hawker, IBM Almaden Research Center, San Jose, CA
    • Random copolymer synthesized by C.J. Hawker, IBM Almaden Research Center, San Jose, CA.
  • 16
    • 0010652832 scopus 로고    scopus 로고
    • note
    • Diblock copolymers synthesized by sequential anionic copolymerization by Polymer Source, Inc., 771 Lajoie Street, Dorval, Quebec, Canada. The 67000 g/mol PS-PMMA diblock has a polydispersity index (PI) of 1.09. The 132000 g/mol diblock has a PI of 1.11.
  • 17
    • 0010696356 scopus 로고    scopus 로고
    • Images processed using Scion Image, Scion Corporation, Frederick, MD 21703
    • Images processed using Scion Image, Scion Corporation, Frederick, MD 21703.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.