Nano-patterning for patterned media using block-copolymer

Journal of Photopolymer Science and Technology

Volumn 15, Issue 3, 2002, Pages 465-470

  Asakawa, Koji ^a   Hiraoka, Toshiro ^a   Hieda, Hiroyuki ^b   Sakurai, Masatoshi ^b   Kamata, Yoshiyuki ^b   Naito, Katsuyuki ^b  

^a Avanced Materials and Devices Laboratory   (Japan)

^b TOSHIBA CORPORATION   (Japan)

Author keywords

Block copolymer; Patterned media; Reactive ion etching; Self assembling

Indexed keywords

CARBON TETRAFLUORIDE; COPOLYMER; FLUORINE DERIVATIVE; OXYGEN; POLY(METHYL METHACRYLATE); POLYSTYRENE; PROPYLENE GLYCOL; UNCLASSIFIED DRUG;

ARTICLE; ATOMIC FORCE MICROSCOPY; FILM; MATERIAL COATING; NANOPARTICLE; PHASE SEPARATION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR; TEMPERATURE;

EID: 0036363269     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.15.465     Document Type: Article

References (12)

1. Advances in resist technology and processing XVIII
2. Optical microlithograpphy XIV