Lithography with a mask of block copolymer microstructures

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 2, 1998, Pages 544-552

  Harrison, Christopher ^a   Park, Miri ^a   Chaikin, Paul M ^a   Register, Richard A ^b   Adamson, Douglas H ^b  

^a PRINCETON UNIVERSITY   (United States)

^b Princeton University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; CHEMICAL MODIFICATION; FLUORINE; MASKS; MICROSTRUCTURE; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; SILICON NITRIDE; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

DEPTH PROFILING; LONG RANGE ORDER; PATTERN TRANSFER; SELF ASSEMBLY;

NANOTECHNOLOGY;

EID: 0032027095     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589860     Document Type: Article

References (32)

1. H. Masuda and F. Fukuda, Science 268, 1466 (1995).
2. M. J. Lercel, M. Rooks, R. G. Tiberio, H. G. Craighead, C. W. Sheen, A. N. Parikh, and D. L. Allara, J. Vac. Sci. Technol. B 13, 1139 (1995).
3. M. H. Kryder, Thin Solid Films 216, 174 (1992).
4. W. Kang, H. L. Stormer, L. N. Pfeiffer, K. W. Baldwin, and K. W. West, Phys. Rev. Lett. 23, 3850 (1993).
5. D. Hofstadter, Phys. Rev. B 14, 2239 (1976).
6. D. J. Thouless, M. Kohmoto, M. P. Nightingale, and M. den Nijs, Phys. Rev. Lett. 49, 405 (1982).
7. D. Weiss, M. L. Roukes, A. Menschig, P. Grambow, K. von Klitzing, and G. Weimann, Phys. Rev. Lett. 66, 2790 (1991).
8. T. L. Morkved, M. Lu, A. M. Urbas, E. E. Ehrichs, H. M. Jaeger, P. Mansky, and T. P. Russell, Science 273, 931 (1996).
9. T. L. Morkved, P. Wiltzius, H. M. Jaeger, D. G. Grier, and T. A. Witten, Appl. Phys. Lett. 64, 422 (1994).
10. P. Mansky, C. K. Harrison, P. M. Chaikin, R. A. Register, and N. Yao, Appl. Phys. Lett. 68, 2586 (1996).
11. P. Mansky, P. Chaikin, and E. L. Thomas, J. Mater Sci. 30, 1987 (1995).
12. Z. Li, W. Zhao, Y. Liu, M. H. Rafailovich, J. Sokolov, K. Khougaz, A. Eisenberg, R. B. Lennox, and G. Krausch, J. Am. Chem. Soc. 118, 10892 (1992).
13. F. S. Bates and G. H. Fredrickson, Annu. Rev. Phys. Chem. 41, 525 (1990).
14. C. Harrison, M. Park, P. M. Chaikin, R. A. Register, D. H. Adamson, and N. Yao, Polymer (in press).
15. Preliminary studies examining the solubility of polystyrene thin films (where thin is defined to be approximately the radius of gyration) and insolubility of polydiene thin films that have been annealed on silicon wafers with native oxides indicate that polydienes interact more strongly with the native oxide. For more information on silica-polydiene interactions, see Refs. 16 and 17.
16. A. Ahagon and A. N. Gent, J. Polym. Sci., Polym. Phys. Ed. 13, 1285 (1975).
17. R. A. L. Jones, L. J. Norton, K. R. Shull, E. J. Kramer, G. P. Felcher, A. Karim, and L. J. Fetters, Macromolecules 25, 2539 (1992).
18. M. Park, C. Harrison, P. M. Chaikin, R. A. Register, and D. H. Adamson, Science 276, 1401 (1997).
19. M. Morton and L. J. Fetters, Rubber Chem. Technol. 48, 359 (1975).
20. S.D. Razumovskii and G.E. Zaikov, Ozone and its Reactions with Organic Compounds (Elsevier, New York, 1984), p. 300.
21. Spontaneous decomposition of gaseous ozone or ozone dissolved in water takes place within hours. The exact time depends on purity, temperature, concentration, and surface of container. For more information about ozone generation and decomposition, see R.G. Rice and A. Netzter, Handbook of Ozone Technology and Applications (Ann Arbor Science, Ann Arbor, Michigan, 1982); B. Langlais, D. Reckhow, and D. Brink, Ozone in Water Treatment, Application and Engineering (Lewis, Chelsea, Michigan, 1991).
22. Spontaneous decomposition of gaseous ozone or ozone dissolved in water takes place within hours. The exact time depends on purity, temperature, concentration, and surface of container. For more information about ozone generation and decomposition, see R.G. Rice and A. Netzter, Handbook of Ozone Technology and Applications (Ann Arbor Science, Ann Arbor, Michigan, 1982); B. Langlais, D. Reckhow, and D. Brink, Ozone in Water Treatment, Application and Engineering (Lewis, Chelsea, Michigan, 1991).
23. J. Brandrup and E. H. Immergut, Polymer Handbook (Wiley, New York, 1989), p. VI/438.
24. J. S. Lee, A. Hirao, and S. Nakahama, Macromolecules 22, 2602 (1989).
25. N. Grassie and G. Scott, Polymer Degradation and Stabilisation (Cambridge University, New York, 1985), p. 195.
26. A. E. Rawson, Water Water Eng., p. 102 (March 1953).
27. Silicon nitride membranes have been used previously for imaging of polymer microstructures, see Ref. 8.
28. The films examined in this section were spin coated at an average thickness of 1.5 layers, producing a morphology of islands and holes. For depth profiling, regions that consisted of one layer of cylinders were selected. For information on islands and holes, see for example, G. Coulon and D. Ausserre, J. Phys. France 51, 777 (1990).
29. 2. A bias of 505 V developed between the anode and cathode.
30. See, for instance, J. P. Spatz, A. Roescher, and M. Moller, Adv. Mater. 8, 337 (1996); J. P. Spatz, S. Mosmer, and M. Moller, Chem. Eur. J. 2, 1552 (1996).
31. See, for instance, J. P. Spatz, A. Roescher, and M. Moller, Adv. Mater. 8, 337 (1996); J. P. Spatz, S. Mosmer, and M. Moller, Chem. Eur. J. 2, 1552 (1996).
32. Selectivity is increased by plasma polymerization. See, for example, H. Yasuda, Plasma Polymerization (Academic, New York, 1985).