Electroless deposition of nanoscale copper patterns via microphase-separated diblock copolymer templated self-assembly

Langmuir

Volumn 15, Issue 19, 1999, Pages 6139-6141

  Zehner, Robert W ^a   Sita, Lawrence R ^a,b  

^a UNIVERSITY OF CHICAGO   (United States)

^b Bldg 142   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM COMPOUNDS; BLOCK COPOLYMERS; COLLOIDS; ELECTROLESS PLATING; NANOSTRUCTURED MATERIALS; PALLADIUM; PASSIVATION; PHASE SEPARATION; PLASTIC FILMS; POLYMETHYL METHACRYLATES; POLYSTYRENES; ULTRATHIN FILMS;

MICROPHASE SEPARATION;

COPPER;

EID: 0032691981     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la9907782     Document Type: Article

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