Hierarchical assembly and compliance of aligned nanoscale polymer cylinders in confinement

Langmuir

Volumn 20, Issue 12, 2004, Pages 5091-5099

  Sundrani, Deepak ^a   Darling, S B ^b   Sibener, S J ^a  

^a UNIVERSITY OF CHICAGO   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALIGNED NANOSCALE POLYMER CYLINDERS; HIERARCHICAL ASSEMBLY; SILICON NITRIDE GRATINGS; SQUARE-WAVE GRATING PATTERNS;

ANNEALING; ATOMIC FORCE MICROSCOPY; BLOCK COPOLYMERS; ELECTRON BEAM LITHOGRAPHY; POLYSTYRENES; REACTIVE ION ETCHING; SELF ASSEMBLY; SINGLE CRYSTALS; SPIN COATING; THIN FILMS;

NANOSTRUCTURED MATERIALS;

ANNEALING; ELECTRIC FIELDS; POLYSTYRENE; SINGLE CRYSTALS; THIN FILMS;

POLYETHYLENE DERIVATIVE; POLYPROPYLENE; POLYSTYRENE DERIVATIVE; SILICON DERIVATIVE; SILICON NITRIDE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; NANOTECHNOLOGY;

MICROSCOPY, ATOMIC FORCE; NANOTECHNOLOGY; POLYETHYLENES; POLYPROPYLENES; POLYSTYRENES; SILICON COMPOUNDS;

EID: 2942711896     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la036123p     Document Type: Article

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