Fabrication of Ni nanocrystal flash memories using a polymeric self-assembly approach

IEEE Electron Device Letters

Volumn 28, Issue 9, 2007, Pages 793-796

  Shahrjerdi, Davood ^a   Garcia Gutierrez, Domingo I ^b   Banerjee, Sanjay K ^a  

^a The University of Texas at Austin   (United States)

^b SEMATECH   (United States)

Author keywords

Diblock copolymer; Nanocrystals; Nonvolatile memory; Self assembly

Indexed keywords

DIBLOCK COPOLYMER; LOW ASPECT RATIOS; MEMORY DEVICES; MEMORY WINDOWS; METHYL METHACRYLATES; NANOCRYSTAL FLASH MEMORIES; NICKEL NANOCRYSTALS; NONVOLATILE MEMORY; PORE DENSITIES; SELF-ASSEMBLED ARRAYS; TRILAYER;

ASPECT RATIO; BLOCK COPOLYMERS; COPOLYMERIZATION; DATA STORAGE EQUIPMENT; ESTERS; FABRICATION; METAL RECOVERY; NANOCRYSTALS; NICKEL; NICKEL ALLOYS; ORGANIC SOLVENTS; POLYMERS; SELF ASSEMBLY; STYRENE;

FLASH MEMORY;

EID: 51849088452     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2007.902612     Document Type: Article

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