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Chemical Vapor Deposition

Volumn 12, Issue 5, 2006, Pages 280-284

New precursors for the CVD of zirconium and hafnium oxide films

(3) Lehn, Jean Sébastien M a Saved, Saba a Hoffman, David M a

a University of Houston (United States)

Author keywords

Hafnium oxide; Hydrazide ligand; Metal amides; MOCVD; Zirconium oxide

Indexed keywords

AMIDES; AMORPHOUS FILMS; ANNEALING; CARBON FILMS; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; HAFNIUM; HAFNIUM COMPOUNDS; LITHIUM; OXIDES; OXYGEN; PHOTOELECTRON SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIA; ZIRCONIUM;

AMORPHOUS; CVD PROCESSES; DEPOSITED FILMS; HAFNIUM OXIDE; HAFNIUM OXIDE FILMS; HYDRAZIDE LIGAND; MOCVD; SOLID STATES; SUBSTRATE TEMPERATURES; TETRAHEDRAL GEOMETRIES; TETRAKIS; X-RAY CRYSTAL STRUCTURES; X-RAY PHOTOELECTRON SPECTROSCOPIES; ZIRCONIUM OXIDE; ZIRCONIUM OXIDE FILMS;

OXIDE FILMS;

EID: 33847170681 PISSN: 09481907 EISSN: 15213862 Source Type: Journal
DOI: 10.1002/cvde.200506434 Document Type: Article

Times cited : (17)

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