Injection induced charging of HfO2 insulators on Si

Materials Science and Engineering: B

Volumn 109, Issue 1-3, 2004, Pages 74-77

  Afanas'ev, V V ^a   Stesmans, A ^a  

^a UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

Charge trapping; Insulating hafnia; Intrinsic photogeneration; Protons

Indexed keywords

ANNEALING; CRYSTAL ORIENTATION; ELECTRIC INSULATING MATERIALS; ELECTRON SPIN RESONANCE SPECTROSCOPY; ENERGY GAP; FILM GROWTH; HOLE TRAPS; LEAKAGE CURRENTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON;

CHARGE TRAPPING; INSULATING HAFNIA; INTRINSIC PHOTOGENERATION; POST DEPOSITION ANNEALING (PDA);

HAFNIUM COMPOUNDS;

EID: 2342505825     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2003.10.049     Document Type: Conference Paper

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