Ultra-thin zirconium and hafnium silicate films deposited by mocvd on Si(100)

Proceedings - Electrochemical Society

Volumn 28, Issue , 2003, Pages 125-134

  Landheer, D ^a   Wu, X ^a   Chen, H W ^b   Lee, M S ^c   Moisa, S ^a   Huang, T Y ^b   Chap, T S ^b   Lu, Z H ^c   Lennard, W N ^d  

^a NATIONAL RESEARCH COUNCIL CANADA   (Canada)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^c UNIVERSITY OF TORONTO   (Canada)

^d UNIVERSITY OF WESTERN ONTARIO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CMOS INTEGRATED CIRCUITS; HIGH RESOLUTION ELECTRON MICROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SILICATES; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIUM;

GAS PHASE; INTERFACE LAYERS; PHASE REACTIONS; SILICATE FILMS;

THIN FILMS;

EID: 8744237297     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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