Growth of hafnium dioxide thin films by liquid-injection MOCVD using alkylamide and hydroxylamide precursors

Chemical Vapor Deposition

Volumn 9, Issue 6, 2003, Pages 309-314

  Williams, Paul A ^b   Jones, Anthony C ^a   Tobin, Neil L ^a   Chalker, Paul R ^a   Taylor, Stephen ^a   Marshall, Paul A ^a   Bickley, Jamie F ^a   Smith, Lesley M ^b   Davies, Hywel O ^b   Critchlow, Gary W ^c  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

^b Epichem Ltd   (United Kingdom)

^c LOUGHBOROUGH UNIVERSITY   (United Kingdom)

Author keywords

Alkylamide ligands; Hafnium dioxide; Hydroxylamide ligands; Liquid injection MOCVD

Indexed keywords

CMOS INTEGRATED CIRCUITS; DIELECTRIC FILMS; FILM GROWTH; HAFNIUM COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NETWORKS (CIRCUITS); PROBLEM SOLVING; SILICON;

ALKYLAMIDE LIGANDS; HAFNIUM DIOXIDE; HYDROXYLAMIDE LIGANDS; LIQUID-INJECTION METALLORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD);

THIN FILMS;

EID: 1942484094     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200306271     Document Type: Article

References (32)

1. R. D. Valtri, F. S. Galasso, German Patent DE 3427911, 1986.
2. W. H. Lowdermilk, D. Milam, F. Rainer, Thin Solid Films 1980, 73, 155.
3. V. K. Khanna, R. K. Nahar, Appl. Surf. Sci. 1987, 28, 247.
4. S. B. Desu, T. Shi, C. K. Kwok, in Chemical Vapor Deposition of Refractory Metals and Ceramics (Eds: T. M. Besman, B. M. Gallois), Mater. Res. Soc. Symp. Proc. 1990, 168, 349.
5. G. D. Wilk, R. M. Wallace, J. M. Anthony, J. Appl. Phys. 2001, 89, 5243.
6. R. C. Smith, T. Ma, N. Hoilien, L. Y. Tsung, M. J. Bevan, L. Colombo, J. Roberts, S. A. Campbell, W. Gladfelter, Adv. Mater. Opt. Electron. 2000, 10, 105.
7. A. C. Jones, J. Mater. Chem. 2002, 12, 2576.
8. C. F. Powell in Chemically Deposited Nonmetals (Eds: C. F. Powell, J. H. Oxley, J. M. Blocher), John Wiley & Sons Inc., New York 1966. pp. 343-420.
9. M. Pulver, G. Wahl, Electrochem. Soc. Proc. 1997, 97-25, 960.
10. M. Balog, M. Schieber, M. Michman, S. Patai, J. Electrochem. Soc. 1979, 126, 1203.
11. D. G. Colombo, D. C. Gilmer, V. G. Young Jr., S. A. Campbell, W. L. Gladfelter, Chem. Vap. Deposition 1998, 4, 220.
12. S. Pakswer, P. Skoug in Thin Dielectric Oxide Films Made By Oxygen Assisted Pyrolysis of Alkoxides (Eds: J. M. Blocher, J. C. Withers), The Electrochemical Society, Los Angeles, CA 1970, p. 619.
13. P. A. Williams, J. L. Roberts, A. C. Jones, P. R. Chalker, J. F. Bickley, A. Steiner, H. O. Davies, T. J. Leedham, J. Mater. Chem. 2002, 12, 165.
14. P. A. Williams, J. L. Roberts, A. C. Jones, P. R. Chalker, N. L. Tobin, J. F. Bickley, H. O. Davies, L. M. Smith, T. J. Leedham Chem. Vap. Deposition 2002, 8, 163.
15. S. Taylor, P. A. Williams, J. L. Roberts, A. C. Jones, P. R. Chalker, Electron. Lett. 2002, 38, 21.
16. A. Bastiani, G. A. Battiston, R. Gerbasi, M. Porchia, S. Daolio, J. Phys. IV 1995, 5, C-525.
17. Y. Oshita, A. Ogura, A. Hoshino, S. Hiiro, H. Machida, J. Cryst. Growth 2001, 233, 292.
18. Y. Ohshita, A. Ogura, A. Hoshino, S. Hiiro, T. Suzuki, H. Machida, Thin Solid Films 2002, 406, 215.
19. A. C. Jones, P. R. Chalker, J. Phys. D: Appl. Phys. 2003, 36, R80.
20. N. W. Mitzel, S. Parsons, A. J. Blake, D. W. H. Rankin, J. Chem. Soc., Dalton Trans. 1996, 2089.
21. A. Singh, C. K. Sharma, A. K. Rai, V. D. Gupta, R. C. Mehrotra, J. Chem. Soc. A 1971, 2440.
22. M. H. Chisholm, C. E. Hammond, J. C. Huffman, Polyhedron 1988, 7, 2515.
23. A. C. Jones, T. J. Leedham, P. J. Wright, M. J. Crosbie, K. A. Fleeting, D. J. Otway, P. O'Brien, M. E. Pemble, Chem. Vap. Deposition 1998, 8, 1773.
24. A. C. Jones, T. J. Leedham, P. J. Wright, M. J. Crosbie, P. A. Lane, D. J. Williams, K. A. Fleeting, D. J. Otway, P.O'Brien, Chem. Vap. Deposition 1998, 4, 46.
25. K. D. Pollard, R. J. Puddephat, Chem. Mater. 1999, 77, 1069.
26. Joint Committee on Powder Diffraction Standards Card No. 6-0318'.
27. a) R. C. Garvie in High Temperature Oxides (Ed: A. M. Alper), Academic Press, New York, NY 1970 p. 118.
28. b) C. T. Lynch, in High Temperature Oxides (Ed: A. M. Alper), Academic Press, New York 1970, p. 193.
29. K. Kukli, M. Ritala, M. Leskelä, T. Sajavaara, J. Keinonan, A. C. Jones, J. L. Roberts, Chem. Mater. 2003, 15, 1722.
30. K. Kukli, M. Ritala, M. Leskelä, T. Sajavaara, J. Keinonan, A. C. Jones, J. L. Roberts, Chem. Vap. Deposition, in press.
31. J. F Zhang, S. Taylor, P. Watkinson, W. Eccleston, Appl. Surf. Sci. 1989 39, 374.
32. M. Sheldrick, SHELX97, Crystal Structure Determination Programme. Göttingen 1997.