Low-temperature atomic-layer-deposition lift-off method for microelectronic and nanoelectronic applications

Applied Physics Letters

Volumn 83, Issue 12, 2003, Pages 2405-2407

  Biercuk, M J ^a   Monsma, D J ^a   Marcus, C M ^a   Backer, J S ^b   Gordon, R G ^b  

^a HARVARD UNIVERSITY   (United States)

^b HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; NANOTECHNOLOGY; PERMITTIVITY; PHOTORESISTS; SPUTTER DEPOSITION; SURFACE ROUGHNESS; THIN FILMS; ZIRCONIA;

ATOMIC LAYER DEPOSITION;

MICROELECTRONIC PROCESSING;

EID: 0142090049     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1612904     Document Type: Article

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