Evaluation of HfO2 film structures deposited by metal-organic chemical vapor deposition using Hf(N(C2H5) 2)4/O2 gas system

Thin Solid Films

Volumn 441, Issue 1-2, 2003, Pages 161-164

  Ogura, Atsushi ^a   Ito, Kimihiko ^a   Ohshita, Yoshio ^b   Ishikawa, Masato ^c   Machida, Hideaki ^c  

^a NEC CORPORATION   (Japan)

^b TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

^c TRI Chemical Laboratory Inc   (Japan)

Author keywords

Deposition temperature; Metal organic chemical vapor deposition; Surface morphology

Indexed keywords

DIFFUSION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY;

SURFACE DIFFUSION;

THIN FILMS;

EID: 0042509984     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00672-2     Document Type: Article

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