Physical, Chemical, and Electrical Characterization of High-κ Dielectrics on Ge and GaAs

Springer Series in Advanced Microelectronics

Volumn 27, Issue , 2007, Pages 181-209

  Spiga, S ^a   Wiemer, C ^a   Scarel, G ^a   Seguini, G ^a   Fanciulli, M ^a   Zenkevich, A ^b   Lebedinskii, Yu ^b  

^a LABORATORIO MDM   (Italy)

^b NATIONAL RESEARCH NUCLEAR UNIVERSITY MEPHI   (Russian Federation)

Author keywords

Equivalent Oxide Thickness; Metal Organic Chemical Vapor Deposition; Metal Oxide Semiconductor; Metal Oxide Semiconductor Capacitor; Precursor Combination

Indexed keywords

EID: 85103571956     PISSN: 14370387     EISSN: 21976643     Source Type: Book Series    
DOI: 10.1007/978-3-540-71491-0_8     Document Type: Chapter

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