Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures

Applied Surface Science

Volumn 173, Issue 1-2, 2001, Pages 15-21

  Aarik, Jaan ^a   Aidla, Aleks ^a   Mändar, Hugo ^a   Uustare, Teet ^a   Kukli, Kaupo ^a   Schuisky, Mikael ^b  

^a UNIVERSITY OF TARTU   (Estonia)

^b UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; DEPOSITION; FILM GROWTH; HIGH TEMPERATURE OPERATIONS; NANOSTRUCTURED MATERIALS; PHASE TRANSITIONS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; THIN FILMS;

ATOMIC LAYER DEPOSITION;

HAFNIUM COMPOUNDS;

EID: 0034825377     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00859-X     Document Type: Article

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