Epitaxial growth of TiO2 thin films by pulsed laser deposition on GaAs(100) substrates

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 2, 2001, Pages 391-393

  Liu, X ^a   Chen, X Y ^a   Yin, J ^a   Liu, Z G ^a   Liu, J M ^a   Yin, X B ^a   Chen, G X ^a   Wang, M ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; EPITAXIAL GROWTH; EXCIMER LASERS; FILM GROWTH; PULSED LASER DEPOSITION; SEMICONDUCTING GALLIUM ARSENIDE; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS; VACUUM APPLICATIONS;

RUTILE FILMS;

TITANIUM DIOXIDE;

EID: 0035271904     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1339017     Document Type: Article

References (11)