Atomic layer epitaxy - a valuable tool for nanotechnology?

Nanotechnology

Volumn 10, Issue 1, 1999, Pages 19-24

  Ritala, Mikko ^a   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; EPITAXIAL GROWTH; FILM GROWTH; THICKNESS CONTROL; THIN FILMS;

ATOMIC LAYER EPITAXY (ALE);

NANOTECHNOLOGY;

EID: 0032682630     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/10/1/005     Document Type: Article

References (47)

1. Suntola T 1989 Mater. Sci. Rep. 4 261
2. Leskelä M and Ritala M 1995 J. Physique IV 5 C5-937
3. Niinistö L, Ritala M and Leskelä M 1996 Mater. Sci. Engng B 41 23
4. Ritala M 1997 Appl. Surf. Sci. 112 223
5. Morishita S, Uchida Y and Matsumura M 1995 Japan. J. Appl. Phys. 34 5738
6. Klaus J W, Sneh O and George S M 1997 Science 278 1934
7. Sneh O, Wise M L, Ott A W, Okada L A and George S M 1995 Surf. Sci. 334 135
8. Haukka S, Lakomaa E-L and Root A 1993 J. Phys. Chem. 97 5085
9. Haukka S, Lakomaa E-L and Suntola T 1993 Thin Solid Films 225 280
10. Haukka S, Lakomaa E-L, Jylhä O, Vilhunen J and Hornytzkyj S 1993 Langmuir 9 3497
11. Lakomaa E-L 1994 Appl. Surf. Sci. 75 185
12. Lindblad M, Haukka S, Kytökivi A, Lakomaa E-L, Rautiainen A and Suntola T 1997 Appl. Surf. Sci. 121/122 286
13. Ott A W, McCarley K C, Klaus J W, Way J D and George S M 1996 Appl. Surf. Sci. 107 128
14. George S M, Ott A W and Klaus J W 1996 J. Phys. Chem. 100 13 121
15. Ylilammi M 1996 Thin Solid Films 279 124
16. Ritala M, Leskelä M, Johansson L.-S. and Niinistö L 1993 Thin Solid Films 228 32
17. Ritala M, Leskelä M, Niinistö L, Prohaska T, Friedbacher G and Grasserbauer M 1994 Thin Solid Films 250 72
18. Asikainen T, Ritala M, Leskelä M, Prohaska T, Friedbacher G and Grasserbauer M 1996 Appl. Surf. Sci. 99 91
19. Ihanus J, Ritala M, Leskelä M, Prohaska T, Resch R, Friedbacher G and Grasserbauer M 1997 Appl. Surf. Sci. 120 43
20. Ott A W, Johnson J M, Klaus J W and George S M 1997 Appl. Surf. Sci. 112 205
21. Ritala M, Saloniemi H, Leskelä M, Prohaska T, Friedbacher G and Grasserbauer M 1996 Thin Solid Films 286 54
22. Yokoyama H, Tanimoto M, Shinohara M and Inoue N 1994 Appl. Surf. Sci. 82/83 158
23. Usui A, Sunakawa H, Stützler F J and Ishida K 1990 Appl. Phys. Lett. 56 289
24. Fan J-F and Toyoda K 1992 Appl. Surf. Sci. 60/61 765
25. Ritala M, Leskelä M, Dekker J-P, Mutsaers C, Soininen P J and Skarp J 1999 Chem. Vapor Depos. in press
26. Ott A W, Klaus J W, Johnson J M, George S M, McCarley K C and Way J D 1997 Chem. Mater. 9 707
27. Matero R, Ritala M, Leskelä M, Salo T, Aromaa J and Forsén O to be published
28. Dücsö C, Khanh N Q, Horváth Z, Barsony I, Utriainen M, Lehto S, Nieminen M and Niinistö L 1996 J. Electrochem. Soc. 143 683
29. Utriainen M, Lehto S, Niinistö L, Dücsö C, Khanh N Q, Horváth Z E, Bársony I and Pécz B 1997 Thin Solid Films 297 39
30. Mori K, Sugou S, Kato Y and Usui A 1992 Appl. Phys. Lett. 60 1717
31. Sakuma Y, Ozeki M, Ohtsuka N, Matsumiya Y, Shigematsu H, Ueda O, Muto S, Nakajima K and Yokoyama N 1994 Appl. Surf. Sci. 82/83 46
32. Riihelä D, Ritala M, Matero R and Leskelä M 1996 Thin Solid Films 289 250
33. Kumagai H, Toyoda K, Kobayashi K, Obara M, Iimura Y 1997 Appl. Phys. Lett. 70 2338
34. Ishii M, Iwai S, Kawata H, Ueki T and Aoyagi Y 1997 J. Cryst. Growth 180 15
35. Kumagai H, Matsumoto M, Kawamura Y, Toyoda K and Obara M 1994 Japan. J. Appl. Phys. 33 7086
36. Kukli K, Ihanus J, Ritala M and Leskelä M 1996 Appl. Phys. Lett. 68 3737
37. Kukli K, Ihanus J, Ritala M and Leskelä M 1997 J. Electrochem. Soc. 144 300
38. Kukli K, Ritala M and Leskelä M 1997 Nanostruct. Mater. 8 785
39. Isshiki H, Iwai S, Meguro T, Aoyagi Y and Sugano T 1994 J. Cryst. Growth 145 976
40. Isshiki H, Aoyagi Y, Sugano T, Iwai S and Meguro T 1995 J. Appl. Phys. 78 7277
41. Isshiki H, Aoyagi Y and Sugano T 1997 Appl. Surf. Sci. 112 122
42. Zhu Z, Kurtz E, Arai K, Chen Y F, Bagnall D M, Tomashini P, Lu F, Sekiguchi T, Yao T, Yasuda T and Segawa Y 1997 Phys. Status Solidi B 202 827
43. Mukai K, Ohtsuka N, Sugawara M and Yamazaki S 1994 Japan. J. Appl. Phys. 33 L1710
44. Mukai K, Ohtsuka N and Sugawara M 1996 Japan. J. Appl. Phys. 35 L262
45. Mukai K, Ohtsuka N, Shoji H and Sugawara M 1997 Appl. Surf. Sci. 112 102
46. Ishikawa H, Shoji H, Nakata Y, Mukai K, Sugawara M, Egawa M, Otsuka N, Sugiyama Y, Futatsugi T and Yokoyama N 1998 J. Vac. Sci. Technol. A 16 794
47. Mårtensson P and Carlsson J-O 1998 J. Electrochem. Soc. 145 2926