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Volumn 34, Issue 4, 2010, Pages 173-190

Extreme ultraviolet lithography with table top lasers

Author keywords

EUV lasers; Interferometric lithography; Nanopatterning

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; INTERFEROMETRY;

EID: 77955581722     PISSN: 00796727     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.pquantelec.2010.03.001     Document Type: Review
Times cited : (34)

References (103)
  • 60
    • 71049182633 scopus 로고    scopus 로고
    • Nanometer scale machining by laser ablation with a focused extreme ultraviolet laser beam
    • Baltimore
    • H. Bravo, B.T. Szapiro, P. Wachulak, et al., Nanometer scale machining by laser ablation with a focused extreme ultraviolet laser beam, in: Proceedings of the CLEO-IQEC 09. 2009: Baltimore.
    • (2009) Proceedings of the CLEO-IQEC 09
    • Bravo, H.1    Szapiro, B.T.2    Wachulak, P.3
  • 91
    • 77955586060 scopus 로고    scopus 로고
    • CXRO
    • CXRO, http://www-cxro.lbl.gov/.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.