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Volumn 34, Issue 4, 2010, Pages 173-190
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Extreme ultraviolet lithography with table top lasers
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Author keywords
EUV lasers; Interferometric lithography; Nanopatterning
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Indexed keywords
EXTREME ULTRAVIOLET LITHOGRAPHY;
INTERFEROMETRY;
COHERENT ILLUMINATION;
DEGREE OF COHERENCE;
EUV LASERS;
EXTREME ULTRAVIOLET LASERS;
HIGH BRIGHTNESS;
INTERFEROMETRIC LITHOGRAPHY;
LABORATORY ENVIRONMENT;
NANOPATTERNING;
ULTRAVIOLET LASERS;
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EID: 77955581722
PISSN: 00796727
EISSN: None
Source Type: Journal
DOI: 10.1016/j.pquantelec.2010.03.001 Document Type: Review |
Times cited : (34)
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References (103)
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