4X reduction extreme ultraviolet interferometric lithography

Optics Express

Volumn 16, Issue 12, 2008, Pages 9106-9111

  Isoyan, Artak ^a   Wuest A ^b   Wallace, John ^a   Jiang, Fan ^a   Cerrina, Franco ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; LITHOGRAPHY; MASKS; PHOTORESISTS; SYNCHROTRON RADIATION;

DIFFRACTION ORDERS; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET RADIATIONS; HYDROGEN SILSESQUIOXANE; INTERFEROMETRIC FRINGES; INTERFEROMETRIC LITHOGRAPHY; MASK FABRICATION; UNIVERSITY OF WISCONSIN - MADISON;

INTERFEROMETRY;

ARTICLE; COMPUTER SIMULATION; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; INTERFEROMETRY; LIGHT; PHOTOGRAPHY; RADIATION SCATTERING; REFRACTOMETRY; SYNCHROTRON; THEORETICAL MODEL; ULTRAVIOLET RADIATION;

COMPUTER SIMULATION; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; INTERFEROMETRY; LIGHT; MODELS, THEORETICAL; PHOTOGRAPHY; REFRACTOMETRY; SCATTERING, RADIATION; SYNCHROTRONS; ULTRAVIOLET RAYS;

EID: 45249085424     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.009106     Document Type: Article

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