Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination

Optics Letters

Volumn 34, Issue 3, 2009, Pages 271-273

  Brizuela, F ^a   Wang, Y ^b   Brewer, C A ^b   Pedaci, F ^b   Chao, W ^b   Anderson, E H ^b   Liu, Y ^b   Goldberg, K A ^b   Naulleau, P ^b   Wachulak, P ^b   Marconi, M C ^b   Attwood, D T ^b   Rocca, J J ^b   Menoni, C S ^b  

^a Department of Environmental and Radiological Health Sciences   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; OPTICAL SYSTEMS; PHOTOLITHOGRAPHY;

AERIAL IMAGES; EXPOSURE-TIME; EXTREME ULTRAVIOLET LASERS; EXTREME ULTRAVIOLET LITHOGRAPHY MASKS; PHOTOLITHOGRAPHY MASKS; REFLECTION MICROSCOPE; SPATIAL RESOLUTION; TABLETOP LASERS;

ULTRAVIOLET LASERS;

EID: 59349087621     PISSN: 01469592     EISSN: 15394794     Source Type: Journal    
DOI: 10.1364/OL.34.000271     Document Type: Article

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