Immersion lithography at 157 nm

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2353-2356

  Switkes, M ^a   Rothschild, M ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; LENSES; LIGHT TRANSMISSION; POLYETHERS; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ANALYSIS; THICKNESS MEASUREMENT;

IMMERSION LIQUIDS; IMMERSION LITHOGRAPHY; INDEX MATCHING MEDIUM; PERFLUOROPOLYETHERS; RESIST TECHNOLOGY;

LITHOGRAPHY;

EID: 0035519137     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1412895     Document Type: Article

References (9)

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