Do not always blame the photons: Relationships between deprotection blur, line-edge roughness, and shot noise in extreme ultraviolet photoresists

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 2, 2009, Pages 665-670

  Anderson, Christopher N ^a   Naulleau, Patrick P ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL CONTRASTS; CORNER ROUNDING; DE PROTECTIONS; DOMINANT MECHANISMS; EXTREME ULTRA VIOLETS; LINE-EDGE ROUGHNESS; PEB TEMPERATURES; POST-EXPOSURE BAKE TEMPERATURES; ROHM AND HAAS;

LASER PULSES; PHOTORESISTORS; PHOTORESISTS; SHOT NOISE; SURFACE TREATMENT; ULTRAVIOLET DEVICES; WINDOWS OPERATING SYSTEM;

ROUGHNESS MEASUREMENT;

EID: 64549122890     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3100270     Document Type: Article

References (22)

1. T. Wallow, R. Kim, B. La Fontaine, P. Naulleau, C. Anderson, and R. Sandberg, Proc. SPIE 6533, 653317 (2007).
2. R. Brainard, P. Trefonas, J. Lammers, C. Cutler, J. Mackevich, A. Trefonas, and S. Robertson, Proc. SPIE 5374, 74 (2004).
3. D. Steenwinckel, J. Lammers, T. Koehler, R. Brainard, and P. Trefonas, J. Vac. Sci. Technol. B 24, 316 (2006).
4. C. Anderson, P. Naulleau, D. Naikoula, E. Hassanien, R. Brainard, G. Gallatin, and K. Dean, J. Vac. Sci. Technol. B 26, 2295 (2008).
5. P. Dirsken, J. Braat, A. J. E. M. Janssen, A. Leeuwestein, H. Kwinten, and D. V. Steenwinckel, Proc. SPIE 5377, 150 (2004).
6. C. Anderson and P. Naulleau, J. Vac. Sci. Technol. B 27, 6 (2009).
7. P. Naulleau and C. Anderson, Proc. SPIE 6517, 65172N (2007).
8. C. Anderson and P. Naulleau, Appl. Opt. 47, 56 (2008).
9. J. Hoffnagle, W. D. Hinsberg, F. A. Houle, and M. I. Sanchez, Proc. SPIE 5038, 464 (2003).
10. T. Brunner, C. Fonseca, N. Seong, and M. Burkhardt, Proc. SPIE 5377, 141 (2004).
11. C. Anderson and P. Naulleau, Proc. SPIE 6923, 69230Z (2008).
12. SUMMIT software is distributed by EUV Technology, Martinez, CA 94553 (http://www.euvl.com/summit).
13. F. Houle, W. Hinsberg, M. Morrison, M. Sanchez, G. Wallraff, C. Larson, and J. Hoffnagle, J. Vac. Sci. Technol. B 18, 1874 (2000).
14. P. Naulleau, Proc. SPIE 5374, 881 (2004).
15. K. Goldberg, P. Naulleau, P. Denham, S. Rekawa, K. Jackson, E. Anderson, and J. Alexander Liddle, J. Vac. Sci. Technol. B 22, 2956 (2004).
16. R. Brainard, E. Hassanein, J. Li, P. Pathak, B. Thiel, F. Cerrina, R. Moore, M. Rodriguez, B. Yakshinskiy, E. Loginova, T. Madey, R. Matyi, M. Malloy, A. Rudack, P. Naulleau, A. Wuest, and K. Dean, Proc. SPIE 6923, 692325 (2008).
17. V. Constantoudis, G. Patsis, A. Tseperi, and E. Gogolides, J. Vac. Sci. Technol. B 21, 1019 (2003).
18. P. Naulleau, E. Gullikson, A. Aquila, S. George, and D. Niakoula, Opt. Express 16, 11519 (2008).
19. P. Naulleau and G. Gallatin, J. Vac. Sci. Technol. B 26, 1903 (2008).
20. H. Fukuda and A. Yamaguchi, Proc. SPIE 4961, 158 (2002).
21. J. Meiring, T. Michaelson, A. Jamieson, G. Schmid, and C. Willson, Proc. SPIE 5753, 350 (2005).
22. V. Sarris, G. P. Patsis, V. Constantoudis, A. G. Boudouvis, and E. Gogolides, Jpn. J. Appl. Phys., Part 1 44, 7400 (2005).