메뉴 건너뛰기




Volumn 15, Issue 6, 2007, Pages 3465-3469

Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography

Author keywords

[No Author keywords available]

Indexed keywords

ARRAY PROCESSING; INTERFEROMETERS; LITHOGRAPHY;

EID: 33947387933     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.15.003465     Document Type: Article
Times cited : (48)

References (19)
  • 1
    • 27144539117 scopus 로고    scopus 로고
    • Spin-dependent scattering in multilayered magnetic rings
    • F. J. Castano, D. Morecroft, W. Jung, and C. A. Ross, "Spin-dependent scattering in multilayered magnetic rings," Phys. Rev. Lett. 95, 137201 (2005).
    • (2005) Phys. Rev. Lett , vol.95 , pp. 137201
    • Castano, F.J.1    Morecroft, D.2    Jung, W.3    Ross, C.A.4
  • 2
    • 42749107863 scopus 로고    scopus 로고
    • Magnetic configurations in 160-520-nm-diameter ferromagnetic rings
    • F. J. Castano, C. A. Ross, A. Eilez, W. Jung, and C. Frandsen, "Magnetic configurations in 160-520-nm-diameter ferromagnetic rings," Phys. Rev. B 69, 144421 (2004).
    • (2004) Phys. Rev. B , vol.69 , pp. 144421
    • Castano, F.J.1    Ross, C.A.2    Eilez, A.3    Jung, W.4    Frandsen, C.5
  • 4
    • 4243706604 scopus 로고    scopus 로고
    • Nanoimprint fabrication of micro-rings for magnetization reversal studies
    • Y. Chen, A. Lebib, S. P. Li, M. Natali, D. Peyrade, and E. Cambril, "Nanoimprint fabrication of micro-rings for magnetization reversal studies," Microelectron. Eng. 57-8, 405 (2001).
    • (2001) Microelectron. Eng , vol.57 -8 , pp. 405
    • Chen, Y.1    Lebib, A.2    Li, S.P.3    Natali, M.4    Peyrade, D.5    Cambril, E.6
  • 5
    • 0141636577 scopus 로고    scopus 로고
    • Current-driven magnetization reversal and spin-wave excitations in Co/Cu/Co pillars
    • J. A. Katine, F. J. Albert, R. A. Buhrman, E. B. Myers, and D. C. Ralph, "Current-driven magnetization reversal and spin-wave excitations in Co/Cu/Co pillars," Phys. Rev. Lett. 84, 3149 (2000).
    • (2000) Phys. Rev. Lett , vol.84 , pp. 3149
    • Katine, J.A.1    Albert, F.J.2    Buhrman, R.A.3    Myers, E.B.4    Ralph, D.C.5
  • 6
    • 0035310004 scopus 로고    scopus 로고
    • Size and thickness dependencies of magnetization reversal in Co dot arrays
    • A. Lebib, S. P. Li, M Natali, and Y. Chen, "Size and thickness dependencies of magnetization reversal in Co dot arrays," J. Appl. Phys. 89, 3892 (2001).
    • (2001) J. Appl. Phys , vol.89 , pp. 3892
    • Lebib, A.1    Li, S.P.2    Natali, M.3    Chen, Y.4
  • 7
    • 33344458381 scopus 로고    scopus 로고
    • Critical phenomena in chiral symmetry breakdown of micromagnetic configurations in a nanostructured ferromagnetic ring
    • E. Saitoh, K. Harii, H. Miyajima, T. Yamaoka, and S. Okuma, "Critical phenomena in chiral symmetry breakdown of micromagnetic configurations in a nanostructured ferromagnetic ring," Phys. Rev. B 71, 172406 (2005).
    • (2005) Phys. Rev. B , vol.71 , pp. 172406
    • Saitoh, E.1    Harii, K.2    Miyajima, H.3    Yamaoka, T.4    Okuma, S.5
  • 9
    • 0346704264 scopus 로고    scopus 로고
    • Unconventional methods for fabricating and patterning nanostructures
    • Y. N. Xia, J. A. Rogers, K. E. Paul, and G. M. Whitesides, "Unconventional methods for fabricating and patterning nanostructures, " Chem. Rev. 99, 1823 (1999).
    • (1999) Chem. Rev , vol.99 , pp. 1823
    • Xia, Y.N.1    Rogers, J.A.2    Paul, K.E.3    Whitesides, G.M.4
  • 10
    • 4544300248 scopus 로고    scopus 로고
    • Patterning: Principles and some new developments
    • M. Geissler, and Y. N. Xia, "Patterning: Principles and some new developments," Advanced Mater. 16, 1249 (2004).
    • (2004) Advanced Mater , vol.16 , pp. 1249
    • Geissler, M.1    Xia, Y.N.2
  • 11
    • 29044439343 scopus 로고    scopus 로고
    • Large-area, infrared nanophotonic materials fabricated using interferometric lithography
    • W. J. Fan, S. Zhang, K. J. Malloy, and S. R. J. Brueck, "Large-area, infrared nanophotonic materials fabricated using interferometric lithography," J. Vac. Sci. Technol. B 23, 2700 (2005).
    • (2005) J. Vac. Sci. Technol. B , vol.23 , pp. 2700
    • Fan, W.J.1    Zhang, S.2    Malloy, K.J.3    Brueck, S.R.J.4
  • 13
    • 0001242779 scopus 로고    scopus 로고
    • Patterning of sub-50 nm dense features with spaceinvariant 157 nm interference lithography
    • M. Switkes, T. M. Bloomstein, and M. Rothschild, "Patterning of sub-50 nm dense features with spaceinvariant 157 nm interference lithography," Appl. Phys. Lett. 77, 3149 (2000).
    • (2000) Appl. Phys. Lett , vol.77 , pp. 3149
    • Switkes, M.1    Bloomstein, T.M.2    Rothschild, M.3
  • 14
    • 33646741447 scopus 로고    scopus 로고
    • Nanolithography with coherent extreme ultraviolet light
    • H. H. Solak, "Nanolithography with coherent extreme ultraviolet light," J. Phys. D 39, R171-R188 (2006).
    • (2006) J. Phys. D , vol.39
    • Solak, H.H.1
  • 17
    • 0035280229 scopus 로고    scopus 로고
    • Achievement of essentially full spatial coherence in a high-average-power soft-x-ray laser
    • Y. Liu, M. Seminario, F. J. Tomasel, C. Chang, J. J. Rocca, and D. T. Attwood, "Achievement of essentially full spatial coherence in a high-average-power soft-x-ray laser," Phys. Rev. A 6303, 033802 (2001).
    • (2001) Phys. Rev. A , vol.6303 , pp. 033802
    • Liu, Y.1    Seminario, M.2    Tomasel, F.J.3    Chang, C.4    Rocca, J.J.5    Attwood, D.T.6
  • 19
    • 31144469890 scopus 로고    scopus 로고
    • Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography
    • I. Junarsa, M. P. Stoykovich, P. F. Nealey, Y. S. Ma, and F. Cerrina, "Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography," J. Vacuum Science Technol. B 23, 138 (2005).
    • (2005) J. Vacuum Science Technol. B , vol.23 , pp. 138
    • Junarsa, I.1    Stoykovich, M.P.2    Nealey, P.F.3    Ma, Y.S.4    Cerrina, F.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.