Multiple-beam interference lithography with electron beam written gratings

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2844-2848

  Solak, H H ^a   David, C ^a   Gobrecht, J ^a   Wang, L ^b   Cerrina, F ^b  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COHERENT LIGHT; DIFFRACTION GRATINGS; ELECTRON BEAMS; MATHEMATICAL MODELS; SUBSTRATES; SYNCHROTRON RADIATION;

INTERFERENCE LITHOGRAPHY; TRANSMISSION DIFFRACTION GRATINGS;

LITHOGRAPHY;

EID: 0036883168     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1518015     Document Type: Article

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