Four-wave EUV interference lithography

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 77-82

  Solak, H H ^a   David, C ^a   Gobrecht, J ^a   Wang, L ^b   Cerrina, F ^b  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

Diffraction grating; Extreme ultraviolet; Holographic lithography; Multiple beam; Undulator

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; HOLOGRAPHY; LIGHT INTERFERENCE; LIGHT POLARIZATION; PHOTORESISTS; SUBSTRATES; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) INTERFERENCE LITHOGRAPHY;

MICROELECTRONICS;

EID: 0038768418     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00579-8     Document Type: Conference Paper

References (11)