Reflection mode imaging with nanoscale resolution using a compact extreme ultraviolet laser

Optics Express

Volumn 13, Issue 11, 2005, Pages 3983-3988

  Brizuela, F ^a   Vaschenko, G ^a   Brewer, C ^a   Grisham, M ^a   Menoni, C S ^a   Marconi, M C ^a   Rocca, J J ^a   Chao, W ^b   Liddle, J A ^b   Andersen, E H ^b   Attwood, D T ^b   Vinogradov, A V ^c   Artioukov, I A ^c   Pershyn, Y P ^d   Kondratenko, V V ^d  

^a Engineering Research Center and Hydraulics Laboratory   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c LEBEDEV PHYSICAL INSTITUTE   (Russian Federation)

^d NATIONAL TECHNICAL UNIVERSITY   (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUITS; LASERS; LIGHT REFLECTION; MICROELECTRONICS; NANOTECHNOLOGY; OPTICAL MICROSCOPY; SYNCHROTRON RADIATION; ULTRAVIOLET RADIATION; X RAYS;

CAPILLARY DISCHARGE LASERS; EXTREME ULTRAVIOLET LASERS; NANOSCALE RESOLUTION; REFLECTION MODE IMAGING;

IMAGING TECHNIQUES;

EID: 21244461155     PISSN: 10944087     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OPEX.13.003983     Document Type: Article

References (15)

1. Y. Garini, B. J. Vermolen, and I. T. Young, "From micro to nano: recent advances in high-resolution microscopy," Current Opinion in Biotechnology 16, 3-12 (2005).
2. W. Chao, E. Anderson, G. P. Denbeaux, B. Harteneck, J. A. Liddle, D. L. Olynick, A. L. Pearson, F. Salmassi, C. Y. Song, and D. T. Attwood, "20-nm-resolution soft x-ray microscopy demonstrated by use of multilayer test structures," Opt. Lett. 28, 2019-2021 (2003).
3. M. Weiland, Ch. Spielmann, U. Kleineberg, Th. Westerwalbesloh, U. Heinzmann, and T. Wilhein, "Towards time-resolved soft X-ray microscopy using pulsed fs-high-harmonic radiation," Ultramicoscopy 102, 93-100 (2005).
4. A. R. Libertun, X. Zhang, A. Paul, D. Raymondson, E. Gershgoren, E. Gagnon, S. Backus, M. M. Murnane, H. C. Kapteyn, R. A. Bartels, Y. Liu, and D. T. Attwood, "High-resolution EUV imaging using high harmonic generation," Conference on Lasers and Electro-Optics Technical Digest, Article JMD4 (2004).
5. J. A. Trail and R. L. Byer, "Compact scanning soft-x-ray microscope using a laser-produced plasma source and normal-incidence multilayer mirrors," Opt. Lett. 14, 539-541 (1989).
6. I. A. Artioukov, A. V. Vinogradov, V. E. Asadchikov, Y. S. Kasyanov, R. V. Serov, A. I. Fedorenko, V. V. Kondratenko, and S. Y. Yulin, "Schwartzschild soft-x-ray microscope for imaging of nonradiating objects," Opt. Lett. 20, 2451-2453 (1995).
7. G. Vaschenko, F. Brizuela, C. Brewer, M. Grisham, H. Mancini, C. S. Menoni, M. Marconi, and J. J. Rocca, "Nano-imaging with a compact extreme ultraviolet laser," Opt. Lett, in press (2005).
8. D.S. DiCicco, D. Kim, R. Rosser, and S. Suckewer, "First stage in the development of a soft-x-ray reflection imaging microscope in the Schwarzschild configuration using a soft-x-ray laser at 18.2 nm," Opt. Lett. 17, 157-159 (1992).
9. T. Haga, H. Kinoshita, K. Hamamoto, S. Takada, N. Kazui, S. Kakunai, H. Tsubakino, and T. Watanabe, "Evaluation of finished extreme ultraviolet lithography (EUVL) masks using a EUV microscope," Jpn. J. Appl. Phys. 42, 3771-3775 (2003).
10. P. P. Naulleau, "Advanced EUV Lithography Capabilities at Lawrence Berkeley National Laboratory's Advanced Light Source," Proceedings, SEMI Technology Symposium 2004;
11. P. P. Naulleau, K. A. Goldberg, E. H. Anderson, P. Denham, B. Hoef, K. Jackson, A. Morlens, and S. Rekawa, "EUV microexposures at the ALS using the 0.3-NA MET projection optics," Microlithography 2005, paper [5751-04]. i.b. Procc. SPIE 5374, 881-91 (2004).
12. Yu. A. Uspenskii, V. E. Lavashov, A. V. Vinogradov, A. I. Fedorenko, V. V. Kondratenko, Yu. P. Pershin, E. N. Zubarev, and V. Yu. Fedotov, "High-reflectivity multilayer mirrors for a vacuum-ultraviolet interval of 35-50 nm," Opt. Lett. 23, 771-773 (1998).
13. B. R. Benware, C. D. Macchietto, C. H. Moreno, and J. J. Rocca, "Demonstration of a high average power tabletop soft x-ray laser," Phys. Rev. Lett 81, 5804-5807 (1998).
14. Y. Liu, M. Seminario, F. G. Tomasel, C. Chang, J. J. Rocca, and D. T. Attwood, "Achievement of essentially full spatial coherence in a high-average-power soft-x-ray laser," Phys. Rev. A 63, 033802 (2001).
15. Y. Wang, M.A. Larotonda, B.M. Luther, D. Alessi, M. Berrill, V.N. Shlyaptsev, and J.J. Rocca, "Demonstration of saturated high repetition rate tabletop soft x-ray lasers at wavelength down to 13.9 nm", to be published, (2005).