Photon-beam lithography reaches 12.5 nm half-pitch resolution

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 1, 2007, Pages 91-95

  Solak, Harun H ^a   Ekinci, Yasin ^a   Käser, Philipp ^a   Park, Sunggook ^b  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b Louisiana State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; ELECTRON DIFFRACTION; LIGHT SOURCES; OPTICAL RESOLVING POWER; SHOT NOISE; SYNCHROTRON RADIATION;

LINE/SPACE PATTERNS; SYNCHROTRON SOURCES;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 34047113478     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2401612     Document Type: Article

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