Use of interferometric lithography to characterize the spatial resolution of a photoresist film

Journal of Photopolymer Science and Technology

Volumn 16, Issue 3, 2003, Pages 373-379

  Hoffnagle, John A ^a   Hinsberg, William D ^a   Houle, Frances A ^a   Sanchez, Martha I ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Modulation transfer function; Photoresist; Spatial resolution

Indexed keywords

ARTICLE; FOURIER TRANSFORMATION; IMAGING; INTERFEROMETRY; LITHOGRAPHY; MODEL; MODULATION TRANSFER FUNCTION; PROCESS TECHNOLOGY; QUANTITATIVE ANALYSIS;

EID: 0038168324     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.16.373     Document Type: Article

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