Plasmonic nanolithography

Nano Letters

Volumn 4, Issue 6, 2004, Pages 1085-1088

  Srituravanich, Werayut ^a   Fang, Nicholas ^a   Sun, Cheng ^a   Luo, Qi ^a   Zhang, Xiang ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARTICLE; DENSITY; FIELD EMISSION; LIGHT SCATTERING; NANOTECHNOLOGY; PHOTOREACTIVATION; SPIKE WAVE; SURFACE PLASMON RESONANCE; ULTRAVIOLET RADIATION; WAVEFORM;

EID: 3042799702     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl049573q     Document Type: Article

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21. -6 Torr) tend to be slightly smaller, resulting in the shift toward longer wavelength.