Imaging capabilities of resist in deep ultraviolet liquid immersion interferometric lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3459-3464

  Raub, Alex K ^a   Frauenglass, A ^a   Brueck, S R J ^a   Conley, Will ^b   Dammel, Ralph ^c   Romano, Andy ^c   Sato, Mitsuru ^d   Hinsberg, William ^e  

^a UNIVERSITY OF NEW MEXICO   (United States)

^b SEMATECH   (United States)

^c AZ Electronic Materials USA Corp   (United States)

^d TOK   (Japan)

^e IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMMERSION RESISTS; INTERFEROMETRIC LITHOGRAPHY; LIQUID IMMERSION LITHOGRAPHY (LIL); WATER IMMERSION;

ABSORPTION; ACRYLICS; ADHESION; COATINGS; CRYSTALS; ELASTIC MODULI; IMAGING TECHNIQUES; INTERFEROMETRY; MICROELECTRONICS; REFRACTIVE INDEX; SURFACE ACTIVE AGENTS; VACUUM APPLICATIONS;

LITHOGRAPHY;

EID: 13244286646     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1824951     Document Type: Conference Paper

References (13)

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8. John H. Burnett and Simon Kaplan, Proc. SPIE 5040, 1742 (2003).
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11. A. K. Raub, A. Frauenglass, S. R. J. Brueck, Will Conley, Ralph Dammel, Andy Romano, Mitsuru Sato, and William Hinsberg, Proc. SPIE 5377, 306 (2004).
12. J. Christopher Taylor, Charles R. Chambers, Ryan Deschner, Robert J. LeSuer, Will Conley, Sean D. Burns, and C. Grant Willson, Proc. SPIE 5376, 34 (2004).
13. William Hinsberg, Gregory Wallraff, Carl Larson, Blake Davis, Vaughn Deline, Simone Raoux, Dolores Miller, Frances Houle, John Hoffnagle, Martha Sanchez, Charles Rettner, Linda Sundberg, David Medeiros, Ralph Dammel, and Will Conley, Proc. SPIE 5376, 21 (2004).