Interferometric lithography with an amplitude division interferometer and a desktop extreme ultraviolet laser

Journal of the Optical Society of America B: Optical Physics

Volumn 25, Issue 7, 2008, Pages

  Wachulak, P ^a,b   Grisham, M ^a,b   Heinbuch, Scott ^a,b   Martz, D ^a,b   Rockward, W ^a,c   Hill, D ^a,c   Rocca, J J ^a,b   Menoni, C S ^a,b   Anderson, E ^a,d   Marconi, M ^a,b  

^a Veterinary Dentistry and Oral Surgery   (United States)

^b Department of Mechanical Engineering   (United States)

^c MOREHOUSE COLLEGE   (United States)

^d LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFEROMETERS; PHOTORESISTS; ULTRAVIOLET LASERS;

BIOLOGICAL APPLICATIONS; CAPILLARY DISCHARGE LASERS; EXTREME ULTRAVIOLET LASERS; HIGH REPETITION RATE; HIGH RESOLUTION; INTERFEROMETRIC LITHOGRAPHY; SHORTER WAVELENGTH; TABLETOP LASERS;

INTERFEROMETRY;

EID: 51849088250     PISSN: 07403224     EISSN: None     Source Type: Journal    
DOI: 10.1364/JOSAB.25.00B104     Document Type: Conference Paper

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