Sub-50 nm period patterns with EUV interference lithography

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 56-62

  Solak, H H ^a   David, C ^a   Gobrecht, J ^a   Golovkina, V ^b   Cerrina, F ^b   Kim, S O ^b   Nealey, P F ^b  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

Diffraction grating; Extreme ultraviolet; Interference lithography; Multiple beam; Undulator

Indexed keywords

DIFFRACTION GRATINGS; SYNCHROTRON RADIATION; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET;

ELECTRON BEAM LITHOGRAPHY;

EID: 0038021007     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00059-5     Document Type: Conference Paper

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