22-nm immersion interference lithography

Optics Express

Volumn 14, Issue 14, 2006, Pages 6434-6443

  Bloomstein, T M ^a   Marchant, M F ^a   Deneault, S ^a   Hardy, D E ^a   Rothschild, M ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; DIFFRACTION GRATINGS; INDEXING (MATERIALS WORKING); LITHOGRAPHY; PHOTORESISTORS; PRISMS; SAPPHIRE;

ABSORBING FLUID; FLUID INDEX; IMMERSION INTERFERENCE LITHOGRAPHY; ULTRAHIGH RESOLUTION;

OPTICAL DEVICES;

EID: 33745869483     PISSN: 10944087     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.14.006434     Document Type: Article

References (7)

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3. M. Switkes and M. Rothschild, "Immersion lithography at 157 nm," J. Vac. Sci. Technol. B 19, 2353 (2001).
4. M. Switkes, T. M. Bloomstein, and M. Rothschild, "Patterning of sub-50 nm dense features with space-invariant 157 nm interference lithography," Appl. Phys. Lett. 20, 3149 (2000).
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