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Volumn 3, Issue 1, 2004, Pages 44-51
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Water immersion optical lithography at 193 nm
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Author keywords
Excimer lasers; Immersion; Optical extension; Optical lithography
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Indexed keywords
FLUID COMPOSITION;
HALF-PITCH RESOLUTION;
OPTICAL EXTENSION;
WATER IMMERSION;
ABERRATIONS;
ABSORPTION;
BIREFRINGENCE;
EXCIMER LASERS;
IMAGING TECHNIQUES;
OPTICAL RESOLVING POWER;
REFRACTIVE INDEX;
SCANNING;
SOLUBILITY;
WAVE PROPAGATION;
PHOTOLITHOGRAPHY;
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EID: 2542482683
PISSN: 15371646
EISSN: None
Source Type: Journal
DOI: 10.1117/1.1637594 Document Type: Article |
Times cited : (45)
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References (12)
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