-
1
-
-
0001326503
-
Bias dependence of instability mechanisms in amorphous silicon thin film transistors
-
Oct.
-
M. J. Powell, C. van Berkel, I. D. French, and D. H. Nichols, "Bias dependence of instability mechanisms in amorphous silicon thin film transistors," Appl. Phys. Lett., vol. 51, no. 16, pp. 1242-1244, Oct. 1987.
-
(1987)
Appl. Phys. Lett.
, vol.51
, Issue.16
, pp. 1242-1244
-
-
Powell, M.J.1
Van Berkel, C.2
French, I.D.3
Nichols, D.H.4
-
2
-
-
21544455021
-
Reversible conductivity changes in discharge produced amorphous Si
-
Aug.
-
D. L. Staebler and C. R. Wronski, "Reversible conductivity changes in discharge produced amorphous Si," Appl. Phys. Lett., vol. 31, no. 4, pp. 292-294, Aug. 1977.
-
(1977)
Appl. Phys. Lett.
, vol.31
, Issue.4
, pp. 292-294
-
-
Staebler, D.L.1
Wronski, C.R.2
-
3
-
-
0037415828
-
ZnO based transparent thin film transistors
-
Feb.
-
R. L. Hoffman, B. J. Norris, and J. F. Wager, "ZnO based transparent thin film transistors," Appl. Phys. Lett., vol. 82, no. 5, pp. 733-735, Feb. 2003.
-
(2003)
Appl. Phys. Lett.
, vol.82
, Issue.5
, pp. 733-735
-
-
Hoffman, R.L.1
Norris, B.J.2
Wager, J.F.3
-
4
-
-
0037450269
-
Transparent ZnO thin-film transistor fabricated by RF magnetron sputtering
-
Feb.
-
P. F. Carcia, R. S. McLean, M. H. Reilly, and G. Nunes, Jr., "Transparent ZnO thin-film transistor fabricated by RF magnetron sputtering," Appl. Phys. Lett., vol. 82, no. 7, pp. 1117-1119, Feb. 2003.
-
(2003)
Appl. Phys. Lett.
, vol.82
, Issue.7
, pp. 1117-1119
-
-
Carcia, P.F.1
McLean, R.S.2
Reilly, M.H.3
Nunes Jr., G.4
-
5
-
-
0038362743
-
Thin film transistor fabricated in single crystal transparent oxide semiconductor
-
May
-
K. Nomura, K. Ohta, K. Ueda, T. Kamiya, M. Hirano, and H. Hosono, "Thin film transistor fabricated in single crystal transparent oxide semiconductor," Science, vol. 300, no. 5623, pp. 1269-1272, May 2003.
-
(2003)
Science
, vol.300
, Issue.5623
, pp. 1269-1272
-
-
Nomura, K.1
Ohta, K.2
Ueda, K.3
Kamiya, T.4
Hirano, M.5
Hosono, H.6
-
7
-
-
9744248669
-
Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
-
Nov.
-
K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano, and H. Hosono, "Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors," Nature, vol. 432, no. 7016, pp. 488-492, Nov. 2004.
-
(2004)
Nature
, vol.432
, Issue.7016
, pp. 488-492
-
-
Nomura, K.1
Ohta, H.2
Takagi, A.3
Kamiya, T.4
Hirano, M.5
Hosono, H.6
-
8
-
-
38649085378
-
Disorder, band offsets, and dopability of transparent conducting oxides
-
Feb.
-
J. Robertson, "Disorder, band offsets, and dopability of transparent conducting oxides," Thin Solid Films, vol. 516, no. 7, pp. 1419-1425, Feb. 2008.
-
(2008)
Thin Solid Films
, vol.516
, Issue.7
, pp. 1419-1425
-
-
Robertson, J.1
-
9
-
-
42649091110
-
Physics of amorphous conducting oxides
-
May
-
J. Robertson, "Physics of amorphous conducting oxides," J. Non-Cryst. Solids, vol. 354, no. 19-25, pp. 2791-2795, May 2008.
-
(2008)
J. Non-Cryst. Solids
, vol.354
, Issue.19-25
, pp. 2791-2795
-
-
Robertson, J.1
-
10
-
-
71949092733
-
The effect of moisture on the photon-enhanced negative bias thermal instability in Ga-In-Zn-O thin film transistors
-
Dec.
-
K. H. Lee, J. S. Jung, K. S. Son, J. S. Park, T. S. Kim, R. Choi, J. K. Jeong, J. Y. Kwon, B. Koo, and S. Lee, "The effect of moisture on the photon-enhanced negative bias thermal instability in Ga-In-Zn-O thin film transistors," Appl. Phys. Lett., vol. 95, no. 23, p. 232 106, Dec. 2009.
-
(2009)
Appl. Phys. Lett.
, vol.95
, Issue.23
, pp. 232106
-
-
Lee, K.H.1
Jung, J.S.2
Son, K.S.3
Park, J.S.4
Kim, T.S.5
Choi, R.6
Jeong, J.K.7
Kwon, J.Y.8
Koo, B.9
Lee, S.10
-
11
-
-
70450200109
-
Transparent electronics for seethrough AMOLED displays
-
Dec.
-
T. Riedl, P. Gorrn, and W. Kowalsky, "Transparent electronics for seethrough AMOLED displays," J. Display Technol., vol. 5, no. 12, pp. 501- 508, Dec. 2009.
-
(2009)
J. Display Technol.
, vol.5
, Issue.12
, pp. 501-508
-
-
Riedl, T.1
Gorrn, P.2
Kowalsky, W.3
-
12
-
-
78649301694
-
76.3: 32-inch LCD panel using amorphous indium-gallium-zinc-oxide TFTs
-
H. H. Lu, H. C. Ting, T. H. Shih, C. Y. Chen, C. S. Chuang, and Y. Lin, "76.3: 32-inch LCD panel using amorphous indium-gallium-zinc-oxide TFTs," in Proc. SID Dig., 2010, pp. 1136-1138.
-
(2010)
Proc. SID Dig.
, pp. 1136-1138
-
-
Lu, H.H.1
Ting, H.C.2
Shih, T.H.3
Chen, C.Y.4
Chuang, C.S.5
Lin, Y.6
-
13
-
-
84863300300
-
69.3: Amorphous oxide TFT backplane for large size AMOLED TVs
-
Y. G. Mo, M. Kim, C. K. Kang, J. H. Jeong, Y. S. Park, C. G. Choi, H. D. Kim, and S. S. Kim, "69.3: Amorphous oxide TFT backplane for large size AMOLED TVs," in Proc. SID Dig., 2010, pp. 1037-1040.
-
(2010)
Proc. SID Dig.
, pp. 1037-1040
-
-
Mo, Y.G.1
Kim, M.2
Kang, C.K.3
Jeong, J.H.4
Park, Y.S.5
Choi, C.G.6
Kim, H.D.7
Kim, S.S.8
-
14
-
-
79951897759
-
69.2: Highly reliable oxidesemiconductor TFT for AM-OLED display
-
T. Arai, N. Morosawa, K. Tokunaga, Y. Terai, E. Fukumoto, T. Fujimori, T. Nakayama, T. Yamaguchi, and T. Sasaoka, "69.2: Highly reliable oxidesemiconductor TFT for AM-OLED display," in Proc. SID Dig., 2010, pp. 1037-1040.
-
(2010)
Proc. SID Dig.
, pp. 1037-1040
-
-
Arai, T.1
Morosawa, N.2
Tokunaga, K.3
Terai, Y.4
Fukumoto, E.5
Fujimori, T.6
Nakayama, T.7
Yamaguchi, T.8
Sasaoka, T.9
-
15
-
-
70349656356
-
Impact of device configuration on the temperature instability of Al-Zn-Sn-O thin film transistors
-
Sep.
-
J. K. Jeong, S. Yang, D. H. Cho, S. H. K. Park, C. S. Hwang, and K. I. Cho, "Impact of device configuration on the temperature instability of Al-Zn- Sn-O thin film transistors," Appl. Phys. Lett., vol. 95, no. 12, p. 123-505, Sep. 2009.
-
(2009)
Appl. Phys. Lett.
, vol.95
, Issue.12
, pp. 123-505
-
-
Jeong, J.K.1
Yang, S.2
Cho, D.H.3
Park, S.H.K.4
Hwang, C.S.5
Cho, K.I.6
-
16
-
-
33645382882
-
Towards see-through displays: Fully transparent thin-film transistors driving transparent organic light-emitting diodes
-
Mar.
-
P. Gorrn, M. Sander, J. Meyer, M. Kroger, E. Becker, H. J. Johannes, W. Kowalsky, and T. Riedl, "Towards see-through displays: Fully transparent thin-film transistors driving transparent organic light-emitting diodes," Adv. Mater., vol. 18, no. 6, pp. 738-741, Mar. 2006.
-
(2006)
Adv. Mater.
, vol.18
, Issue.6
, pp. 738-741
-
-
Gorrn, P.1
Sander, M.2
Meyer, J.3
Kroger, M.4
Becker, E.5
Johannes, H.J.6
Kowalsky, W.7
Riedl, T.8
-
17
-
-
61349185678
-
Zinc tin oxide based driver for highly transparent active matrix OLED displays
-
Mar.
-
P. Gorrn, F. Ghaffari, T. Riedl, and W. Kowalsky, "Zinc tin oxide based driver for highly transparent active matrix OLED displays," Solid State Electron., vol. 53, no. 3, pp. 329-331, Mar. 2009.
-
(2009)
Solid State Electron.
, vol.53
, Issue.3
, pp. 329-331
-
-
Gorrn, P.1
Ghaffari, F.2
Riedl, T.3
Kowalsky, W.4
-
18
-
-
69049119241
-
Gate-bias stress in amorphous oxide semiconductors thin-film transistors
-
Aug.
-
M. E. Lopes, H. L. Gomes, M. C. R. Medeiros, P. Barquinha, L. Pereira, E. Fortunato, R. Martins, and I. Ferreira, "Gate-bias stress in amorphous oxide semiconductors thin-film transistors," Appl. Phys. Lett., vol. 95, no. 6, p. 063 502, Aug. 2009.
-
(2009)
Appl. Phys. Lett.
, vol.95
, Issue.6
, pp. 063-502
-
-
Lopes, M.E.1
Gomes, H.L.2
Medeiros, M.C.R.3
Barquinha, P.4
Pereira, L.5
Fortunato, E.6
Martins, R.7
Ferreira, I.8
-
19
-
-
0024888643
-
The physics of amorphous-Si thin-film transistors
-
Dec.
-
M. Powell, "The physics of amorphous-Si thin-film transistors," IEEE Trans. Electron Devices, vol. 36, no. 12, pp. 2753-2763, Dec. 1989.
-
(1989)
IEEE Trans. Electron Devices
, vol.36
, Issue.12
, pp. 2753-2763
-
-
Powell, M.1
-
20
-
-
25144462707
-
A comprehensive review of ZnO materials and devices
-
Aug.
-
Ü. Özgür, Y. I. Alivov, C. Liu, A. Teke, M. A. Reshchikov, S. Dogan, V. Avrutin, S.-J. Cho, and H. Morkoç, "A comprehensive review of ZnO materials and devices," J. Appl. Phys., vol. 98, no. 4, p. 041-301, Aug. 2005.
-
(2005)
J. Appl. Phys.
, vol.98
, Issue.4
, pp. 041-301
-
-
Özgür, Ü.1
Alivov, Y.I.2
Liu, C.3
Teke, A.4
Reshchikov, M.A.5
Dogan, S.6
Avrutin, V.7
Cho, S.-J.8
Morkoç, H.9
-
21
-
-
44349136836
-
Subgap states in transparent amorphous oxide semiconductor, In-Ga-Zn-O, observed by bulk sensitive X-ray photoelectron spectroscopy
-
May
-
K. Nomura, T. Kamiya, H. Yanagi, E. Ikenaga, K. Yang, K. Kobayashi, M. Hirano, and H. Hosono, "Subgap states in transparent amorphous oxide semiconductor, In-Ga-Zn-O, observed by bulk sensitive X-ray photoelectron spectroscopy," Appl. Phys. Lett., vol. 92, no. 20, p. 202117, May 2008.
-
(2008)
Appl. Phys. Lett.
, vol.92
, Issue.20
, pp. 202117
-
-
Nomura, K.1
Kamiya, T.2
Yanagi, H.3
Ikenaga, E.4
Yang, K.5
Kobayashi, K.6
Hirano, M.7
Hosono, H.8
-
22
-
-
4344560262
-
Chemical sensing and catalysis by onedimensional metal-oxide nanostructures
-
A. Kolmakov and M.Moskovits, "Chemical sensing and catalysis by onedimensional metal-oxide nanostructures," Annu. Rev. Mater. Res., vol. 34, pp. 151-180, 2004.
-
(2004)
Annu. Rev. Mater. Res.
, vol.34
, pp. 151-180
-
-
Kolmakov, A.1
Moskovits, M.2
-
23
-
-
17044363770
-
ZnO nanowire field-effect transistor and oxygen sensing property
-
Dec.
-
Z. Fan, D. Wang, P. C. Chang, W. Y. Tseng, and J. G. Lu, "ZnO nanowire field-effect transistor and oxygen sensing property," Appl. Phys. Lett., vol. 85, no. 24, pp. 5923-5925, Dec. 2004.
-
(2004)
Appl. Phys. Lett.
, vol.85
, Issue.24
, pp. 5923-5925
-
-
Fan, Z.1
Wang, D.2
Chang, P.C.3
Tseng, W.Y.4
Lu, J.G.5
-
24
-
-
27944502060
-
Directed integration of ZnO nanobridge devices on a Si substrate using a ZnO seed layer
-
Nov.
-
J. F. Conley, Jr., L. Stecker, and Y. Ono, "Directed integration of ZnO nanobridge devices on a Si substrate using a ZnO seed layer," Appl. Phys. Lett., vol. 87, no. 22, p. 223114, Nov. 2005.
-
(2005)
Appl. Phys. Lett.
, vol.87
, Issue.22
, pp. 223114
-
-
Conley Jr., J.F.1
Stecker, L.2
Ono, Y.3
-
25
-
-
58349112177
-
Competitive surface effects of oxygen and water on UV photoresponse of ZnO nanowires
-
Jan.
-
Y. Li, F. Della Valle, M. Simonet, I. Yamada, and J. J. Delaunay, "Competitive surface effects of oxygen and water on UV photoresponse of ZnO nanowires," Appl. Phys. Lett., vol. 94, no. 2, p. 023110, Jan. 2009.
-
(2009)
Appl. Phys. Lett.
, vol.94
, Issue.2
, pp. 023110
-
-
Li, Y.1
Della Valle, F.2
Simonet, M.3
Yamada, I.4
Delaunay, J.J.5
-
26
-
-
70449711200
-
Mapping out the distribution of electronic states in the mobility gap of amorphous zinc tin oxide
-
Nov.
-
P. T. Erslev, E. S. Sundholm, R. E. Presley, D. Hong, J. F. Wager, and J. D. Cohen, "Mapping out the distribution of electronic states in the mobility gap of amorphous zinc tin oxide," Appl. Phys. Lett., vol. 95, no. 19, p. 192 115, Nov. 2009.
-
(2009)
Appl. Phys. Lett.
, vol.95
, Issue.19
, pp. 192115
-
-
Erslev, P.T.1
Sundholm, E.S.2
Presley, R.E.3
Hong, D.4
Wager, J.F.5
Cohen, J.D.6
-
27
-
-
36049015883
-
The influence of visible light on transparent zinc tin oxide thin film transistors
-
Nov.
-
P. Gorrn, M. Lehnhardt, T. Riedl, and W. Kowalsky, "The influence of visible light on transparent zinc tin oxide thin film transistors," Appl. Phys. Lett., vol. 91, no. 19, p. 193 504, Nov. 2007.
-
(2007)
Appl. Phys. Lett.
, vol.91
, Issue.19
, pp. 193504
-
-
Gorrn, P.1
Lehnhardt, M.2
Riedl, T.3
W.Kowalsky, T.4
-
28
-
-
44249123058
-
Amorphous IZObased transparent thin film transistors
-
Jul.
-
D. C. Paine, B. Yaglioglu, Z. Beiley, and S. Lee, "Amorphous IZObased transparent thin film transistors," Thin Solid Films, vol. 516, no. 17, pp. 5894-5898, Jul. 2008.
-
(2008)
Thin Solid Films
, vol.516
, Issue.17
, pp. 5894-5898
-
-
Paine, D.C.1
Yaglioglu, B.2
Beiley, Z.3
Lee, S.4
-
29
-
-
33744792281
-
Effect of UV and visible light radiation on the electrical performances of transparent TFTs based on amorphous indium zinc oxide
-
Jun.
-
P. Barquinha, A. Pimentel, A. Marques, L. Pereira, R. Martins, and E. Fortunato, "Effect of UV and visible light radiation on the electrical performances of transparent TFTs based on amorphous indium zinc oxide," J. Non-Cryst. Solids, vol. 352, no. 9-20, pp. 1756-1760, Jun. 2006.
-
(2006)
J. Non-Cryst. Solids
, vol.352
, Issue.9-20
, pp. 1756-1760
-
-
Barquinha, P.1
Pimentel, A.2
Marques, A.3
Pereira, L.4
Martins, R.5
Fortunato, E.6
-
30
-
-
33846070644
-
Investigating the stability of ZnO thin film transistors
-
Dec.
-
R. B. M. Cross and M. M. De Souza, "Investigating the stability of ZnO thin film transistors," Appl. Phys. Lett., vol. 89, no. 26, p. 263 513, Dec. 2006.
-
(2006)
Appl. Phys. Lett.
, vol.89
, Issue.26
, pp. 263513
-
-
Cross, R.B.M.1
De Souza, M.M.2
-
31
-
-
37549040163
-
Stable indium oxide thin-film transistors with fast threshold voltage recovery
-
Dec.
-
Y. Vygraneko, K. Wang, and A. Nathan, "Stable indium oxide thin-film transistors with fast threshold voltage recovery," Appl. Phys. Lett., vol. 91, no. 26, p. 263 508, Dec. 2007.
-
(2007)
Appl. Phys. Lett.
, vol.91
, Issue.26
, pp. 263508
-
-
Vygraneko, Y.1
Wang, K.2
Nathan, A.3
-
32
-
-
51349141239
-
Bias-stressinduced stretched-exponential time dependence of threshold voltage shift in InGaZnO thin film transistors
-
Sep.
-
J. M. Lee, I. T. Cho, J. H. Lee, and H. I. Kwon, "Bias-stressinduced stretched-exponential time dependence of threshold voltage shift in InGaZnO thin film transistors," Appl. Phys. Lett., vol. 93, no. 9, p. 093 504, Sep. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.93
, Issue.9
, pp. 093504
-
-
Lee, J.M.1
Cho, I.T.2
Lee, J.H.3
Kwon, H.I.4
-
33
-
-
44649153699
-
4 thin film transistors
-
May
-
4 thin film transistors," J. Vac. Sci. Technol. B, Microelectron. Nanometer Struct., vol. 26, no. 3, pp. 959-962, May 2008.
-
(2008)
J. Vac. Sci. Technol. B, Microelectron. Nanometer Struct.
, vol.26
, Issue.3
, pp. 959-962
-
-
Lim, W.1
Kim, S.2
Wang, Y.L.3
Lee, J.W.4
Norton, D.P.5
Pearton, S.J.6
Ren, F.7
Kravchenko, I.I.8
-
34
-
-
55149087921
-
3-ZnO thin-film transistors
-
Aug.
-
3-ZnO thin-film transistors," Jpn. J. Appl. Phys., vol. 47, no. 8, pp. 6236-6240, Aug. 2008.
-
(2008)
Jpn. J. Appl. Phys.
, vol.47
, Issue.8
, pp. 6236-6240
-
-
Fujii, M.1
Yano, H.2
Hatayama, T.3
Uraoka, Y.4
Fuyuki, T.5
Jung, J.S.6
Kwon, J.Y.7
-
35
-
-
63649106046
-
High performance solution-processed amorphous zinc tin oxide thin film transistor
-
Feb.
-
S. J. Seo, C. G. Choi, Y. H. Hwang, and B. S. Bae, "High performance solution-processed amorphous zinc tin oxide thin film transistor," J. Phys. D, Appl. Phys., vol. 42, no. 3, p. 035 106, Feb. 2009.
-
(2009)
J. Phys. D, Appl. Phys.
, vol.42
, Issue.3
, pp. 035106
-
-
Seo, S.J.1
Choi, C.G.2
Hwang, Y.H.3
Bae, B.S.4
-
36
-
-
33846965196
-
Stability of transparent zinc tin oxide transistors under bias stress
-
Feb.
-
P. Gorrn, P. Holzer, T. Riedl,W. Kowalsky, J.Wang, T.Weimann, P. Hinze, and S. Kipp, "Stability of transparent zinc tin oxide transistors under bias stress," Appl. Phys. Lett., vol. 90, no. 6, p. 063 502, Feb. 2007.
-
(2007)
Appl. Phys. Lett.
, vol.90
, Issue.6
, pp. 063502
-
-
Gorrn, P.1
Holzer, P.2
Riedl, T.3
Kowalsky, W.4
Wang, J.5
Weimann, T.6
Hinze, P.7
Kipp, S.8
-
37
-
-
68349096402
-
Stability of indium oxide thin film transistors by reactive ion beam assisted deposition
-
Oct.
-
Y. Vygranenko, K. Wang, R. Chaji, M. Vieira, J. Robertson, and A. Nathan, "Stability of indium oxide thin film transistors by reactive ion beam assisted deposition," Thin Solid Films, vol. 517, no. 23, pp. 6341- 6344, Oct. 2009.
-
(2009)
Thin Solid Films
, vol.517
, Issue.23
, pp. 6341-6344
-
-
Vygrane, Y.1
Wang, A.K.2
Chaji, R.3
Vieira, M.4
Robertson, J.5
Nathan, A.6
-
38
-
-
71949116567
-
Environment-dependent metastability of passivation-free indium zinc oxide thin film transistor after gate bias stress
-
Dec.
-
P. T. Liu, Y. T. Chou, and L. F. Teng, "Environment-dependent metastability of passivation-free indium zinc oxide thin film transistor after gate bias stress," Appl. Phys. Lett., vol. 95, no. 23, p. 233504. Dec. 2009.
-
(2009)
Appl. Phys. Lett.
, vol.95
, Issue.23
, pp. 233504
-
-
Liu, P.T.1
Chou, Y.T.2
Teng, L.F.3
-
39
-
-
38549145327
-
Bias stress stability of indium gallium zinc oxide channel based transparent thin film transistors
-
Jan.
-
A. Suresh and J. F. Muth, "Bias stress stability of indium gallium zinc oxide channel based transparent thin film transistors," Appl. Phys. Lett., vol. 92, no. 3, p. 033 502, Jan. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.92
, Issue.3
, pp. 033502
-
-
Suresh, A.1
Muth, J.F.2
-
40
-
-
67650474594
-
Origins of threshold voltage shifts in room-temperature deposited and annealed a-In-Ga-Zn-O thin-film transistors
-
Jul.
-
K. Nomura, T. Kamiya, M. Hirano, and H. Hosono, "Origins of threshold voltage shifts in room-temperature deposited and annealed a-In-Ga-Zn- O thin-film transistors," Appl. Phys. Lett., vol. 95, no. 1, p. 013 502, Jul. 2009.
-
(2009)
Appl. Phys. Lett.
, vol.95
, Issue.1
, pp. 013502
-
-
Nomura, K.1
Kamiya, T.2
Hirano, M.3
Hosono, H.4
-
41
-
-
67650156081
-
Constant-voltage bias-stress testing of a-IGZO thin-film transistors
-
Jul.
-
K. Hosino, D. Hong, H. Q. Chiang, and J. F. Wager, "Constant-voltage bias-stress testing of a-IGZO thin-film transistors," IEEE Trans. Electron Devices, vol. 56, no. 7, pp. 1365-1370, Jul. 2009.
-
(2009)
IEEE Trans. Electron Devices
, vol.56
, Issue.7
, pp. 1365-1370
-
-
Hosino, K.1
Hong, D.2
Chiang, H.Q.3
Wager, J.F.4
-
42
-
-
36049009350
-
Ultra-high long-term stability of oxide-TTFTs under current stress
-
Oct.
-
T. Riedl, P. Gorrn, P. Holzer, and W. Kowalsky, "Ultra-high long-term stability of oxide-TTFTs under current stress," Phys. Stat. Sol. (RRL), vol. 1, no. 5, pp. 175-177, Oct. 2007.
-
(2007)
Phys. Stat. Sol. (RRL)
, vol.1
, Issue.5
, pp. 175-177
-
-
Riedl, T.1
Gorrn, P.2
Holzer, P.3
Kowalsky, W.4
-
43
-
-
77957234556
-
3 gate dielectrics
-
Jul.
-
3 gate dielectrics," J. Vac. Sci. Technol. B, Microelectron. Nanometer Struct., vol. 28, no. 4, pp. C5I1-C5I6, Jul. 2010.
-
(2010)
J. Vac. Sci. Technol. B, Microelectron. Nanometer Struct.
, vol.28
, Issue.4
-
-
Triska, J.1
Conley Jr., J.F.2
Presley, R.3
Wager, J.F.4
-
44
-
-
54949102088
-
Improving the gate stability of ZnO thin film transistors with aluminum oxide dielectric layers
-
M. S. Oh, K. Lee, J. H. Song, B. H. Lee, M. M. Sung, D. K. Hwang, and S. Im, "Improving the gate stability of ZnO thin film transistors with aluminum oxide dielectric layers," J. Electrochem. Soc., vol. 155, no. 12, pp. H1 009-H1 014, 2008.
-
(2008)
J. Electrochem. Soc.
, vol.155
, Issue.12
-
-
Oh, M.S.1
Lee, K.2
Song, J.H.3
Lee, B.H.4
Sung, M.M.5
Hwang, D.K.6
Im, S.7
-
45
-
-
84870725610
-
21.4: Zinc indium oxide thin-film transistors for active-matrix display backplane
-
R. Hoffman, T. Emery, B. Yeh, T. Koch, and W. Jackson, "21.4: Zinc indium oxide thin-film transistors for active-matrix display backplane," in Proc. SID Dig., 2010, pp. 288-291.
-
(2010)
Proc. SID Dig.
, pp. 288-291
-
-
Hoffman, R.1
Emery, T.2
Yeh, B.3
Koch, T.4
Jackson, W.5
-
46
-
-
70349668804
-
The influence of the gate dielectrics on threshold voltage instability in amorphous indium-gallium-zinc oxide thin film transistors
-
Sep.
-
J. Lee, J. S. Park, Y. S. Pyo, D. B. Lee, E. H. Kim, D. Stryahilev, T. W. Kim, D. U. Jin, and Y. G. Mo, "The influence of the gate dielectrics on threshold voltage instability in amorphous indium-gallium-zinc oxide thin film transistors," Appl. Phys. Lett., vol. 95, no. 12, p. 123 502. Sep. 2009.
-
(2009)
Appl. Phys. Lett.
, vol.95
, Issue.12
, pp. 123502
-
-
Lee, J.1
Park, J.S.2
Pyo, Y.S.3
Lee, D.B.4
Kim, E.H.5
Stryahilev, D.6
Kim, T.W.7
Jin, D.U.8
Mo, Y.G.9
-
47
-
-
71649115815
-
Amorphous In-Ga-Zn-O thinfilm transistor with coplanar homojunction structure
-
Dec.
-
A. Sato, M. Shimada, K. Abe, R. Hayashi, H. Kumomi, K. Nomura, T. Kamiya, M. Hirano, and H. Hosono, "Amorphous In-Ga-Zn-O thinfilm transistor with coplanar homojunction structure," Thin Solid Films, vol. 518, no. 4, pp. 1309-1313, Dec. 2009.
-
(2009)
Thin Solid Films
, vol.518
, Issue.4
, pp. 1309-1313
-
-
Sato, A.1
Shimada, M.2
Abe, K.3
Hayashi, R.4
Kumomi, H.5
Nomura, K.6
Kamiya, T.7
Hirano, M.8
Hosono, H.9
-
48
-
-
77950071500
-
Fast flexible plastic substrate ZnO circuits
-
Apr.
-
D. Zhao, D. A.Mourney, and T. N. Jackson, "Fast flexible plastic substrate ZnO circuits," IEEE Electron Device Lett., vol. 31, no. 4, pp. 323-325, Apr. 2010.
-
(2010)
IEEE Electron Device Lett.
, vol.31
, Issue.4
, pp. 323-325
-
-
Zhao, D.1
Mourney, D.A.2
Jackson, T.N.3
-
49
-
-
76349107815
-
Fast PEALD ZnO thin film transistor circuits
-
Feb.
-
D. A. Mourey, D. A. Zhao, J. Sun, and T. N. Jackson, "Fast PEALD ZnO thin film transistor circuits," IEEE Trans. Electron Devices, vol. 57, no. 2, pp. 530-534. Feb. 2010.
-
(2010)
IEEE Trans. Electron Devices
, vol.57
, Issue.2
, pp. 530-534
-
-
Mourey, D.A.1
Zhao, D.A.2
Sun, J.3
Jackson, T.N.4
-
50
-
-
68949101948
-
Stability of thin film transistors incorporating a zinc oxide or indium zinc oxide channel deposited by a high rate sputtering process
-
Aug.
-
A. J. Flewitt, J. D. Dutson, P. Beecher, D. Paul, S. J. Wakeham, M. E. Vickers, C. Ducati, S. P. Speakman,W. I. Milne, andM. J. Thwaites, "Stability of thin film transistors incorporating a zinc oxide or indium zinc oxide channel deposited by a high rate sputtering process," Semicond. Sci. Technol., vol. 24, no. 8, p. 085 002, Aug. 2009.
-
(2009)
Semicond. Sci. Technol.
, vol.24
, Issue.8
, pp. 085002
-
-
Flewitt, A.J.1
Dutson, J.D.2
Beecher, P.3
Paul, D.4
Wakeham, S.J.5
Vickers, M.E.6
Ducati, C.7
Speakman, S.P.8
Milne, W.I.9
Thwaites, M.J.10
-
51
-
-
70349755743
-
Performance and stability of low temperature transparent thin-film transistors using amorphous multicomponent dielectrics
-
P. Barquinha, L. Pereira, G. Gonçalves, R. Martins, D. Kuščer, M. Kosec, and E. Fortunato, "Performance and stability of low temperature transparent thin-film transistors using amorphous multicomponent dielectrics," J. Electrochem. Soc., vol. 156, no. 11, pp. H824- H831, 2009.
-
(2009)
J. Electrochem. Soc.
, vol.156
, Issue.11
-
-
Barquinha, P.1
Pereira, L.2
Gonçalves, G.3
Martins, R.4
Kuščer, D.5
Kosec, M.6
Fortunato, E.7
-
52
-
-
69049093543
-
Charge trapping and detrapping characteristics in amorphous InGaZnO TFTs under static and dynamic stresses
-
Jan.
-
I. T. Cho, J. M. Lee, J. H. Lee, and H. I. Kwon, "Charge trapping and detrapping characteristics in amorphous InGaZnO TFTs under static and dynamic stresses," Semicond. Sci. Technol., vol. 24, no. 1, p. 015 013, Jan. 2009.
-
(2009)
Semicond. Sci. Technol.
, vol.24
, Issue.1
, pp. 015013
-
-
Cho, I.T.1
Lee, J.M.2
Lee, J.H.3
Kwon, H.I.4
-
53
-
-
73849118524
-
Atomic layer deposition ZnO:N thin film transistor: The effects of N concentration on the device properties
-
S. J. Lim, J. M. Kim, D. Kim, S. Kwon, J. S. Park, and H. Kim, "Atomic layer deposition ZnO:N thin film transistor: The effects of N concentration on the device properties," J. Electrochem. Soc., vol. 157, no. 2, pp. H214- H218, 2010.
-
(2010)
J. Electrochem. Soc.
, vol.157
, Issue.2
-
-
Lim, S.J.1
Kim, J.M.2
Kim, D.3
Kwon, S.4
Park, J.S.5
Kim, H.6
-
54
-
-
64249170440
-
The effect of gate-bias stress and temperature on the performance of ZnO thin film transistors
-
Jun.
-
R. B. M. Cross and M. M. De Souza, "The effect of gate-bias stress and temperature on the performance of ZnO thin film transistors," IEEE Trans. Device Mater. Rel., vol. 8, no. 2, pp. 277-282, Jun. 2008.
-
(2008)
IEEE Trans. Device Mater. Rel.
, vol.8
, Issue.2
, pp. 277-282
-
-
Cross, R.B.M.1
De Souza, M.M.2
-
55
-
-
66749143525
-
x gate dielectrics
-
Jun.
-
x gate dielectrics," Appl. Phys. Lett., vol. 94, no. 22, p. 222 112, Jun. 2009.
-
(2009)
Appl. Phys. Lett.
, vol.94
, Issue.22
, pp. 222112
-
-
Lee, J.M.1
Cho, I.T.2
Lee, J.H.3
Cheong, W.S.4
Hwang, C.S.5
Kwon, H.I.6
-
56
-
-
70450210334
-
Electrical instability of RF sputter amorphous In-Ga-Zn-O thin-film transistors
-
Dec.
-
T. Z. Fung, K. Abe, H. Kumomi, and J. Kanicki, "Electrical instability of RF sputter amorphous In-Ga-Zn-O thin-film transistors," J. Display Technol., vol. 5, no. 12, pp. 452-461, Dec. 2009.
-
(2009)
J. Display Technol.
, vol.5
, Issue.12
, pp. 452-461
-
-
Fung, T.Z.1
Abe, K.2
Kumomi, H.3
Kanicki, J.4
-
57
-
-
61349167819
-
Light effects on the bias stability of transparent ZnO thin film transistors
-
Feb.
-
J. J. Shin, J. S. Lee, C. S. Hwang, S. H. K. Park, W. S. Cheong, M. Ryu, C.W. Byun, J. I. Lee, and H. Y. Chu, "Light effects on the bias stability of transparent ZnO thin film transistors," ETRI J., vol. 31, no. 1, pp. 62-64, Feb. 2009.
-
(2009)
ETRI J.
, vol.31
, Issue.1
, pp. 62-64
-
-
Shin, J.J.1
Lee, J.S.2
Hwang, C.S.3
Park, S.H.K.4
Cheong, W.S.5
Ryu, M.6
Byun, C.W.7
Lee, J.I.8
Chu, H.Y.9
-
58
-
-
67651230706
-
Reliable bottom gate amorphous indium-gallium-zinc oxide thin-film transistors with TiOx passivation layer
-
H.-S. Seo, J.-U. Bae, D.-H. Kim, Y. Park, C.-D. Kim, I. B. Kang, I.-J. Chung, J.-H. Choi, and J.-M. Myoung, "Reliable bottom gate amorphous indium-gallium-zinc oxide thin-film transistors with TiOx passivation layer," Electrochem. Solid-State Lett., vol. 12, no. 9, pp. H348-H351, 2009.
-
(2009)
Electrochem. Solid-State Lett.
, vol.12
, Issue.9
-
-
Seo, H.-S.1
Bae, J.-U.2
Kim, D.-H.3
Park, Y.4
Kim, C.-D.5
Kang, I.B.6
Chung, I.-J.7
Choi, J.-H.8
Myoung, J.-M.9
-
59
-
-
0031145997
-
2 films under static and dynamic stress
-
May
-
2 films under static and dynamic stress," IEEE Trans. Electron Devices, vol. 44, no. 5, pp. 801-808, May 1997.
-
(1997)
IEEE Trans. Electron Devices
, vol.44
, Issue.5
, pp. 801-808
-
-
Suehle, J.S.1
Chaparala, P.2
-
60
-
-
42649117785
-
Processing effects on the stability of amorphous indium gallium zinc oxide thin-film transistors
-
May
-
H. Q. Chiang, B. R. McFarlane, D. Hong, R. E. Presley, and J. F. Wager, "Processing effects on the stability of amorphous indium gallium zinc oxide thin-film transistors," J. Non-Cryst. Solids, vol. 354, no. 19-25, pp. 2826-2830, May 2008.
-
(2008)
J. Non-Cryst. Solids
, vol.354
, Issue.19-25
, pp. 2826-2830
-
-
Chiang, H.Q.1
McFarlane, B.R.2
Hong, D.3
Presley, R.E.4
Wager, J.F.5
-
61
-
-
78249268197
-
Bias-stress-stable solution-processed oxide thin film transistors
-
Mar.
-
Y. Jeong, C. Bae, D. Kim, K. Song, K. Woo, H. Shin, G. Cao, and J. Moon, "Bias-stress-stable solution-processed oxide thin film transistors," ACS Appl. Mater. Interfaces, vol. 2, no. 3, pp. 611-615, Mar. 2010.
-
(2010)
ACS Appl. Mater. Interfaces
, vol.2
, Issue.3
, pp. 611-615
-
-
Jeong, Y.1
Bae, C.2
Kim, D.3
Song, K.4
Woo, K.5
Shin, H.6
Cao, G.7
Moon, J.8
-
62
-
-
0016330431
-
2
-
Dec.
-
2," J. Appl. Phys., vol. 45, no. 12, pp. 5373-5378, Dec. 1974.
-
(1974)
J. Appl. Phys.
, vol.45
, Issue.12
, pp. 5373-5378
-
-
Ning, T.H.1
Yu, H.N.2
-
63
-
-
36449009572
-
Bias-stress-induced stretched-exponential time dependence of charge injection and trapping in amorphous thin-film transistors
-
Mar.
-
F. R. Libsch and J. Kanicki, "Bias-stress-induced stretched-exponential time dependence of charge injection and trapping in amorphous thin-film transistors," Appl. Phys. Lett., vol. 62, no. 11, pp. 1286-1288, Mar. 1993.
-
(1993)
Appl. Phys. Lett.
, vol.62
, Issue.11
, pp. 1286-1288
-
-
Libsch, F.R.1
Kanicki, J.2
-
64
-
-
0038650830
-
Charge trapping related threshold voltage instabilities in high permittivity gate dielectric stacks
-
Jun.
-
S. Zafar, A. Callegari, E. Gusev, and M. V. Fischetti, "Charge trapping related threshold voltage instabilities in high permittivity gate dielectric stacks," J. Appl. Phys., vol. 93, no. 11, pp. 9298-9303, Jun. 2003.
-
(2003)
J. Appl. Phys.
, vol.93
, Issue.11
, pp. 9298-9303
-
-
Zafar, S.1
Callegari, A.2
Gusev, E.3
Fischetti, M.V.4
-
65
-
-
52949097961
-
Origin of threshold voltage instability in indium-gallium-zinc oxide thin film transistors
-
Sep.
-
J. K. Jeong, H. W. Yang, J. H. Jeong, Y. G. Mo, and H. D. Kim, "Origin of threshold voltage instability in indium-gallium-zinc oxide thin film transistors," Appl. Phys. Lett., vol. 93, no. 12, p. 123 508, Sep. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.93
, Issue.12
, pp. 123-508
-
-
Jeong, J.K.1
Yang, H.W.2
Jeong, J.H.3
Mo, Y.G.4
Kim, H.D.5
-
66
-
-
68349091584
-
Surface induced time dependent instability of ZnO based thin film transistors
-
Oct.
-
K. T. Kim, K. Lee, M. S. Oh, and S. Im, "Surface induced time dependent instability of ZnO based thin film transistors," Thin Solid Films, vol. 517, no. 23, pp. 6345-6348, Oct. 2009.
-
(2009)
Thin Solid Films
, vol.517
, Issue.23
, pp. 6345-6348
-
-
Kim, K.T.1
Lee, K.2
Oh, M.S.3
Im, S.4
-
67
-
-
39749191514
-
Electronic transport properties of amorphous indium-gallium-zinc oxide semiconductor upon exposure to water
-
Feb.
-
J. S. Park, J. K. Jeong, H. J. Chung, Y. G. Mo, and H. D. Kim, "Electronic transport properties of amorphous indium-gallium-zinc oxide semiconductor upon exposure to water," Appl. Phys. Lett., vol. 92, no. 7, p. 072 104, Feb. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.92
, Issue.7
, pp. 072104
-
-
Park, J.S.1
Jeong, J.K.2
Chung, H.J.3
Mo, Y.G.4
Kim, H.D.5
-
68
-
-
29044441257
-
Passivation of zinc-tin-oxide thin film transistors
-
Nov.
-
D. Hong and J. F. Wager, "Passivation of zinc-tin-oxide thin film transistors," J. Vac. Sci. Technol. B, Microelectron. Nanometer Struct., vol. 23, no. 6, pp. L25-L27, Nov. 2005.
-
(2005)
J. Vac. Sci. Technol. B, Microelectron. Nanometer Struct.
, vol.23
, Issue.6
-
-
Hong, D.1
Wager, J.F.2
-
69
-
-
34248399209
-
Amorphous gallium indium zinc oxide thin film transistors: Sensitive to oxygen molecules
-
May
-
D. Kang, H. Lim, C. Kim, I. Song, J. Park, Y. Park, and J. G. Chung, "Amorphous gallium indium zinc oxide thin film transistors: Sensitive to oxygen molecules," Appl. Phys. Lett., vol. 90, no. 19, p. 192 101, May 2007.
-
(2007)
Appl. Phys. Lett.
, vol.90
, Issue.19
, pp. 192101
-
-
Kang, D.1
Lim, H.2
Kim, C.3
Song, I.4
Park, J.5
Park, Y.6
Chung, J.G.7
-
70
-
-
67650713952
-
Encapsulation of zinc tin oxide based thin film transistors
-
Jun.
-
P. Gorrn, T. Riedl, and W. Kowalsky, "Encapsulation of zinc tin oxide based thin film transistors," J. Phys. Chem. C, vol. 113, no. 25, pp. 11 126- 11 130, Jun. 2009.
-
(2009)
J. Phys. Chem. C
, vol.113
, Issue.25
, pp. 11126-11130
-
-
Gorrn, P.1
Riedl, T.2
Kowalsky, W.3
-
71
-
-
70350089441
-
High mobility amorphous zinc oxynitride semiconductor material for thin film transistors
-
Oct.
-
Y. Ye, R. Lim, and J. M. White, "High mobility amorphous zinc oxynitride semiconductor material for thin film transistors," J. Appl. Phys., vol. 106, no. 7, p. 074 512, Oct. 2009.
-
(2009)
J. Appl. Phys.
, vol.106
, Issue.7
, pp. 074512
-
-
Ye, Y.1
Lim, R.2
White, J.M.3
-
72
-
-
77951462324
-
Directed integration of ZnO nanobridge sensors using pre-patterned carbonized photoresist
-
May
-
C. C. Huang, B. Pelatt, and J. F. Conley, Jr., "Directed integration of ZnO nanobridge sensors using pre-patterned carbonized photoresist," Nanotechnology, vol. 21, no. 19, p. 195 307, May 2010.
-
(2010)
Nanotechnology
, vol.21
, Issue.19
, pp. 195307
-
-
Huang, C.C.1
Pelatt, B.2
Conley Jr., J.F.3
-
73
-
-
58449129794
-
ZnO nanowire field-effect transistor as a UV photodetector; optimization for maximum sensitivity
-
Jan.
-
W. Kim and K. S. Chu, "ZnO nanowire field-effect transistor as a UV photodetector; optimization for maximum sensitivity," Phys. Stat. Sol. (A), vol. 206, no. 1, pp. 179-182, Jan. 2009.
-
(2009)
Phys. Stat. Sol. (A)
, vol.206
, Issue.1
, pp. 179-182
-
-
Kim, W.1
Chu, K.S.2
-
74
-
-
44049087683
-
Stable ZnO thin film transistors by fast open air atomic layer deposition
-
May
-
D. H. Levy, D. Freeman, S. F. Nelson, P. J. Cowdery-Corvan, and L. M. Irving, "Stable ZnO thin film transistors by fast open air atomic layer deposition," Appl. Phys. Lett., vol. 92, no. 19, p. 192 101, May 2008.
-
(2008)
Appl. Phys. Lett.
, vol.92
, Issue.19
, pp. 192101
-
-
Levy, D.H.1
Freeman, D.2
Nelson, S.F.3
Cowdery-Corvan, P.J.4
Irving, L.M.5
-
75
-
-
53649092548
-
Transparent Al-Zn-Sn-O thin film transistors prepared at low temperature
-
Oct.
-
D.-H. Cho, S. Yang, C. Byun, J. Shin, M. K. Ryu, S.-H. K. Park, C.-S. Hwang, S. M. Chung, W.-S. Cheong, S. M. Yoon, and H.-Y. Chu, "Transparent Al-Zn-Sn-O thin film transistors prepared at low temperature," Appl. Phys. Lett., vol. 93, no. 14, p. 142 111, Oct. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.93
, Issue.14
, pp. 142111
-
-
Cho, D.-H.1
Yang, S.2
Byun, C.3
Shin, J.4
Ryu, M.K.5
Park, S.-H.K.6
Hwang, C.-S.7
Chung, S.M.8
Cheong, W.-S.9
Yoon, S.M.10
Chu, H.-Y.11
-
76
-
-
85044574161
-
21.2: Al and Sn doped zinc indium oxide thin film transistors for AMOLED back-plane
-
D.-H. Cho, S. Yang, S.-H. Ko Park, C. Byun, S.-M. Yoon, J.-I. Lee, C.-S. Hwang, H. Y. Chu, and K. I. Cho, "21.2: Al and Sn doped zinc indium oxide thin film transistors for AMOLED back-plane," in Proc. SID, 2009, pp. 280-283.
-
(2009)
Proc. SID
, pp. 280-283
-
-
Cho, D.-H.1
Yang, S.2
Ko Park, S.-H.3
Byun, C.4
Yoon, S.-M.5
Lee, J.-I.6
Hwang, C.-S.7
Chu, H.Y.8
Cho, K.I.9
-
77
-
-
69149104577
-
High performance solution-processed and lithographically patterned zinc-tin oxide thin-film transistors with good operational stability
-
S. K. Park, Y. H. Kim, H. S. Kim, and J. I. Han, "High performance solution-processed and lithographically patterned zinc-tin oxide thin-film transistors with good operational stability," Electrochem. Solid-State Lett., vol. 12, no. 7, pp. H256-H258, 2009.
-
(2009)
Electrochem. Solid-State Lett.
, vol.12
, Issue.7
-
-
Park, S.K.1
Kim, Y.H.2
Kim, H.S.3
Han, J.I.4
-
78
-
-
85008002412
-
Oxide electronics by spatial atomic layer deposition
-
Dec.
-
D. H. Levy, S. F. Nelson, and D. Freeman, "Oxide electronics by spatial atomic layer deposition," J. Display Technol., vol. 5, no. 12, pp. 484-494, Dec. 2009.
-
(2009)
J. Display Technol.
, vol.5
, Issue.12
, pp. 484-494
-
-
Levy, D.H.1
Nelson, S.F.2
Freeman, D.3
-
79
-
-
11644278982
-
2 system?
-
Jul.
-
2 system?" J. Vac. Sci. Technol. B, Microelectron. Nanometer Struct., 16, no. 4, pp. 2134-2153, Jul. 1998.
-
(1998)
J. Vac. Sci. Technol. B, Microelectron. Nanometer Struct.
, vol.16
, Issue.4
, pp. 2134-2153
-
-
Lenahan, P.M.1
Conley Jr., J.F.2
-
80
-
-
0030420056
-
Application of electron spin resonance as a tool for building in reliability
-
W. F. Filter, J. J. Clement, A. S. Oates, R. Rosenberg, and P. M. Lenahan, Eds. Pittsburgh, PA: Mater. Res. Soc.
-
J. F. Conley, Jr., "Application of electron spin resonance as a tool for building in reliability," in Materials Reliability in Microelectronics VI, W. F. Filter, J. J. Clement, A. S. Oates, R. Rosenberg, and P. M. Lenahan, Eds. Pittsburgh, PA: Mater. Res. Soc., 1996, pp. 293-315.
-
(1996)
Materials Reliability in Microelectronics VI
, pp. 293-315
-
-
Conley Jr., J.F.1
-
81
-
-
0012271154
-
2 on Si
-
H. Z. Massoud, E. H. Poindexter, and C. R. Helms, Eds. Pennington, NJ: ECS
-
2 Interface 3, H. Z. Massoud, E. H. Poindexter, and C. R. Helms, Eds. Pennington, NJ: ECS, 1996, pp. 214-249.
-
(1996)
2 Interface 3
, pp. 214-249
-
-
Conley Jr., J.F.1
Lenahan, P.M.2
-
83
-
-
36549102051
-
Electrically active pointdefects in amorphous-silicon nitride-An illumination and charge injection study
-
Oct.
-
J. T. Krick, P. M. Lenahan, and J. Kanicki, "Electrically active pointdefects in amorphous-silicon nitride-An illumination and charge injection study," J. Appl. Phys., vol. 64, no. 7, pp. 3558-3563, Oct. 1988.
-
(1988)
J. Appl. Phys.
, vol.64
, Issue.7
, pp. 3558-3563
-
-
Krick, J.T.1
Lenahan, P.M.2
Kanicki, J.3
-
84
-
-
20444459904
-
Magnetic resonance studies of trapping centers in high- Κ dielectric films on silicon
-
Mar.
-
P. M. Lenahan and J. F. Conley, Jr., "Magnetic resonance studies of trapping centers in high- Κ dielectric films on silicon," IEEE Trans. Device Mater. Rel., vol. 5, no. 1, pp. 90-102, Mar. 2005.
-
(2005)
IEEE Trans. Device Mater. Rel.
, vol.5
, Issue.1
, pp. 90-102
-
-
Lenahan, P.M.1
Conley Jr., J.F.2
-
85
-
-
0002081496
-
Mechanisms behind green photoluminescence in ZnO phosphor powders
-
May
-
K. Vanheusden, W. L. Warren, C. H. Seager, D. R. Tallant, J. A. Voigt, and B. E. Gnade, "Mechanisms behind green photoluminescence in ZnO phosphor powders," J. Appl. Phys., vol. 79, no. 10, pp. 7983-7990, May 1996.
-
(1996)
J. Appl. Phys.
, vol.79
, Issue.10
, pp. 7983-7990
-
-
Vanheusden, K.1
Warren, W.L.2
Seager, C.H.3
Tallant, D.R.4
Voigt, J.A.5
Gnade, B.E.6
-
86
-
-
41649084966
-
4 thin-film transistors
-
Mar.
-
4 thin-film transistors," Appl. Phys. Lett., vol. 92, no. 13, p. 133-512, Mar. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.92
, Issue.13
, pp. 133-512
-
-
Kimura, M.1
Nakanishi, T.2
Nomura, K.3
Kamiya, T.4
Hosono, H.5
-
87
-
-
41649120938
-
4 thin film transistors and their subgap density of states
-
Mar.
-
4 thin film transistors and their subgap density of states," Appl. Phys. Lett., vol. 92, no. 13, p. 133-503, Mar. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.92
, Issue.13
, pp. 133-503
-
-
Hsieh, H.H.1
Kamiya, T.2
Nomura, K.3
Hosono, H.4
Wu, C.C.5
|