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Journal of Vacuum Science and Technology B

Volumn 28, Issue 6, 2010, Pages

Wavelength-specific reflections: A decade of extreme ultraviolet actinic mask inspection research

(2) Goldberg, K A a Mochi, I a

a LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; INSPECTION; PHOTOMASKS;

ACTINIC MASK INSPECTION; CRITICAL DEFECTS; DEEP ULTRAVIOLET; EXTREME ULTRA-VIOLET LITHOGRAPHIES; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET MASKS; INSPECTION TECHNIQUE; MASK INSPECTION; MULTI-LAYER-COATING; PATTERN TRANSFERS;

DEFECTS;

EID: 78650132449 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3498757 Document Type: Article

Times cited : (20)

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