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Volumn 7360, Issue , 2009, Pages

Two magnification steps EUV microscopy with a schwarzschild objective and an adapted zone plate lens

Author keywords

Actinic inspection; EUV detector; EUV microscopy; EUVL mask; Schwarzschild objective; Zone plate

Indexed keywords

ACTINIC INSPECTION; EUV DETECTOR; EUV MICROSCOPY; EUVL MASK; SCHWARZSCHILD OBJECTIVE; ZONE PLATE;

EID: 69949125142     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.822986     Document Type: Conference Paper
Times cited : (8)

References (13)
  • 1
    • 69949186905 scopus 로고    scopus 로고
    • EUV microscopy for defect inspection by dark-field mapping and zone plate zooming
    • XRM-2008 conference proceedings, in print
    • Juschkin L., Freiberger R. and Bergmann, K., "EUV microscopy for defect inspection by dark-field mapping and zone plate zooming", Journal of Physics: Conference Series (IOP), XRM-2008 conference proceedings, in print.
    • Journal of Physics: Conference Series (IOP)
    • Juschkin, L.1    Freiberger, R.2    Bergmann, K.3
  • 3
    • 84975556432 scopus 로고
    • First stage in the development of a soft-x-ray reflection imaging microscope in the schwarzschild configuration using a soft-x-ray laser at 18.2 nm
    • DiCicco D. S., Kim D., Rosser R. and Suckewer S., "First stage in the development of a soft-x-ray reflection imaging microscope in the Schwarzschild configuration using a soft-x-ray laser at 18.2 nm, " Opt. Lett. 17, pp. 157-159 (1992).
    • (1992) Opt. Lett. 17 , pp. 157-159
    • DiCicco, D.S.1    Kim, D.2    Rosser, R.3    Suckewer, S.4
  • 5
    • 69949130407 scopus 로고
    • Reflective soft x-ray microscope for the investigation of objects illuminated by laser-plasma radiation
    • Artioukov I. A., Vinogradov A. V., Asadchikov V. E., et.al., "Reflective soft x-ray microscope for the investigation of objects illuminated by laser-plasma radiation, " Opt. Lett. 20 (24) (1995).
    • (1995) Opt. Lett. 20 , Issue.24
    • Artioukov, I.A.1    Vinogradov, A.V.2    Asadchikov, V.E.3
  • 7
    • 34648836133 scopus 로고    scopus 로고
    • Aerial image mask inspection system for extreme ultraviolet lithography
    • Kinoshita H., Hamamoto K., Sakaya N., Hosoya M. and Watanabe T., "Aerial image mask inspection system for extreme ultraviolet lithography", Jpn. J. Appl. Phys. 46, pp 6113-6117 (2007).
    • (2007) Jpn. J. Appl. Phys. , vol.46 , pp. 6113-6117
    • Kinoshita, H.1    Hamamoto, K.2    Sakaya, N.3    Hosoya, M.4    Watanabe, T.5
  • 13
    • 69949137478 scopus 로고    scopus 로고
    • 8 South Way, Claverings Industrial Estate, London N9 OAB, UK
    • ZonePlates Ltd.: 8 South Way, Claverings Industrial Estate, London N9 OAB, UK, http://www.zoneplates.com (2008).
    • (2008) ZonePlates Ltd.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.