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Volumn 7545, Issue , 2010, Pages

Defect inspection with an EUV microscope

Author keywords

Actinic mask blank inspection; EUV defects; EUV microscopy; Metrology

Indexed keywords

ATOMIC FORCE MICROSCOPES; DARK FIELD; DEFECT DETECTION; DEFECT INSPECTION; DISCHARGE-PRODUCED PLASMAS; EUV DEFECTS; EUV MICROSCOPE; EUV MICROSCOPY; LARGE FIELD OF VIEWS; MASK BLANK; MASK BLANK INSPECTION; METROLOGY; MULTI-LAYER MIRRORS; NATURAL DEFECT; PHOTON FLUX; SCHWARZSCHILD OBJECTIVE; TABLE-TOP; TEST STRUCTURE;

EID: 77957904636     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.863818     Document Type: Conference Paper
Times cited : (10)

References (8)
  • 1
    • 73349121340 scopus 로고    scopus 로고
    • EUV microscopy for defect inspection by dark-field mapping and zone plate zooming
    • L. Juschkin, R. Freiberger, K. Bergmann, EUV microscopy for defect inspection by dark-field mapping and zone plate zooming, Journal of Physics: Conference Series 186, 012030, (2009).
    • (2009) Journal of Physics: Conference Series , vol.186 , pp. 012030
    • Juschkin, L.1    Freiberger, R.2    Bergmann, K.3
  • 2
    • 69949125142 scopus 로고    scopus 로고
    • Two magnification steps EUV microscopy with a Schwarzschild objective and an adapted zone plate lens, EUV and X-Ray Optics: Synergy between Laboratory and Space
    • L. Juschkin, R. Freiberger, Two magnification steps EUV microscopy with a Schwarzschild objective and an adapted zone plate lens, EUV and X-Ray Optics: Synergy between Laboratory and Space, Proceedings of the SPIE, Volume 7360, 736005, (2009).
    • (2009) Proceedings of the SPIE , vol.7360 , pp. 736005
    • Juschkin, L.1    Freiberger, R.2
  • 6
    • 0003920042 scopus 로고    scopus 로고
    • University of California, Berkeley and Lawrence Berkeley National Laboratory
    • D. Attwood, Soft X-Rays and Extreme Ultraviolet Radiation, University of California, Berkeley and Lawrence Berkeley National Laboratory, (2000).
    • (2000) Soft X-rays and Extreme Ultraviolet Radiation
    • Attwood, D.1
  • 8
    • 3843091564 scopus 로고    scopus 로고
    • Enhanced model for the efficient 2D and 3D simulation of defective EUV masks
    • P. Evanschitzky, A. Erdmann, Enhanced model for the efficient 2D and 3D simulation of defective EUV masks, Proc. SPIE 5374, 0277-786X, (2004).
    • (2004) Proc. SPIE , vol.5374
    • Evanschitzky, P.1    Erdmann, A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.