Actinic phase defect detection and printability analysis for patterned EUVL mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

  Terasawa, Tsuneo ^a   Yamane, Takeshi ^a   Tanaka, Toshihiko ^a   Suga, Osamu ^a   Kamo, Takashi ^a   Mori, Ichiro ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

actinic inspection; EUVL; mask blank; phase defect; printability

Indexed keywords

ABSORBER PATTERN; ACTINIC INSPECTION; AT-WAVELENGTH; BUMP DEFECTS; DARK FIELD IMAGING; EUV MASK BLANKS; EUVL MASK BLANKS; EXPOSURE TOOL; FDTD METHOD; FULL-FIELD; LINE PATTERN; MASK BLANK INSPECTION; MULTILAYER DEFECTS; ON-WAFER; PHASE DEFECTS; PHASE-DEFECT DETECTION; TEST MASKS;

EXTREME ULTRAVIOLET LITHOGRAPHY; FINITE DIFFERENCE TIME DOMAIN METHOD; INSPECTION; MULTILAYERS; PHOTOMASKS;

DEFECTS;

EID: 77953469817     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846678     Document Type: Conference Paper

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