High-resolution EUV imaging tools for resist exposure and aerial image monitoring

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 78-89

  Booth, M ^a   Brioso, O ^a   Brunton, A ^a   Cashmore, J ^a   Elbourn, P ^a   Elliner, G ^a   Gower, M ^a   Greuters, J ^a   Grunewald P ^a   Gutierrez, R ^a   Hill, T ^a   Hirsch, J ^a   Kling, L ^a   McEntee, N ^a   Mundair, S ^a   Richards, P ^a   Truffert, V ^a   Wallhead, I ^a   Whitfield, M ^a   Hudyma, R ^b  

^a Exitech Ltd   (United Kingdom)

^b Paragon Optics Inc   (United States)

Author keywords

EUV lithography; Exposure; Inspection; Metrology; Microstepper; Reticle aerial image microscope tools

Indexed keywords

IMAGE ANALYSIS; IMAGING TECHNIQUES; INSPECTION; MEASUREMENTS; MONITORING; TESTING; ULTRAVIOLET RADIATION;

EUV LITHOGRAPHY; EXPOSURE; MICROSTEPPER; RETICLE AERIAL IMAGE MICROSCOPE TOOLS;

OPTICAL DEVICES;

EID: 24644508361     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.606715     Document Type: Conference Paper

References (16)

1. A Brunton, J Cashmore, P Elbourn, G Elliner, M Gower, P Grünewald, M Harman, S Hough, N McEntee, D Rees, P Richards, V Truffert, I Wallhead, M Whitfield, "High-resolution EUV Microstepper tool for resist testing and technology evaluation" Emerging Lithographic Technologies VIII, Ed. R S Mackay, Proc. SPIE 5374, 869-880 (2004)
2. AR Stivers, P-Y Yan, G Zhang, T Liang, E Y Shu, E Tejnil, B Lieberman, R Nagpul, K Hsia, M Penn and F-C Lo, "EUV mask pilot line at Intel Corporation" 24th Annual BACUS SYmposium on Photomask Technology, Eds W Staud and J T Weed, Proc SPIE 5567, 13-22, (2004)
3. O Oestreich, R Klein, F Scholze, J Jonkers, E Louis, A Yakshin, P Goerts, G Ulm, M Haidl, F Bijkerk, "Multilayer reflectance during exposure to EUV radiation" Soft X-ray and EUV Imaging Systems, Eds W M Kaiser and R H Stulen, Proc SPIE 4146, 64-71 (2000)
4. J M Roberts, T Bacuita, R L Bristol, H B Cao, M Chandhok, S H Lee, E M Panning, M Shell, G Zhang and B J Rice, "One small step: the world's first integrated EUVL process line" Paper 5751-05, Emerging Lithographic Technologies IX, Ed. R S Mackay, Proc. SPIE 5751, (2005)
5. H B Cao, W Yueh, J M Roberts, B J Rice, R L Bristol, M Chandhok, "EUV resist patterning performance from the Intel microexposure tool (MET)", Paper 5753-52, Advances in Resist Technology and Processing XXII, Ed. J L Sturtevant, Proc. SPIE 5753, (2005)
6. M Chandhok, S H Lee, E M Panning, J Roberts and H B Cao, "Characterization of flare on Intel's EUV MET tool", Paper 5751-31, Emerging Lithographic Technologies IX, Ed. R S Mackay, Proc. SPIE 5751, (2005)
7. th Annual American Society for Precision Engineering, Scottsdale, Arizona, (Oct 2000)
8. RM Hudyma, "An overview of optical systems for 30nm resolution lithography at EUV wavelengths" International Optical Design Conference 2002- Eds. P K Manhart, J M Sasian, Proc SPIE 4832, 137-148, (2002)
9. rd International EUVL Symposium, Miyazaki, Japan, Paper To01, (Nov 2004)
10. P Naulleau et al, "Status of EUV microexposure capabilities at the ALS using the 0.3NA MET optic" Emerging Lithographic Technologies VIII Ed. R. S. Mackay, Proc. SPIE 5374, 881-891 (2004)
11. P Naulleau et al, "EUV microexposures at the ALS using the 0.3NA MET projection optics" Emerging Lithographic Technologies IX, Ed. R S Mackay, Proc. SPIE 5751, (2005)
12. R Lebert et al, "Status of EUV-lamp development and demonstration of applications", Emerging Lithographic Technologies VIII, Ed. R S Mackay, Proc. SPIE 5374, 943-953, (2004)
13. R. Hudyma, "High numerical aperture ring field projection system for extreme ultraviolet lithography", US Patent 6,033,079, (2000)
14. M Kroon and R Stuik, "Luminescent materials for EUV detection purposes" Emerging Lithographic Technologies V Ed. E A Dobsiz, Proc. SPIE 4343, 665-675 (2001)
15. B La Fontaine et al. "Submicron, soft x-ray fluorescence imaging", Appl. Phys Letts 66, 282-284 (1995)
16. See www.semi.org