High sensitivity actinic detection of native defects on extreme ultraviolet lithography mask blanks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2401-2405

  Yi, Moonsuk ^a   Haga, Tsuneyuki ^b   Walton, Chris ^c   Bokor, Jeffrey ^a,d  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b NTT CORPORATION   (Japan)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^d UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COATINGS; COMPOSITION EFFECTS; DEFECTS; MASKS; MORPHOLOGY; MULTILAYERS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; ULTRAVIOLET RADIATION;

ACTINIC DETECTION; DETECTION SENSITIVITY; EXTREME ULTRAVIOLET; INSPECTION TOOLS; LITHOGRAPHY MASK BLANKS; MULTILAYER COATING;

LITHOGRAPHY;

EID: 0035519154     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1410088     Document Type: Article

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