Carbon contamination topography analysis of EUV masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

  Fan, Yu Jen ^a   Yankulin, Leonid ^a   Thomas, Petros ^a   Mbanaso, Chimaobi ^a   Antohe, Alin ^a   Garg, Rashi ^a   Wang, Yunfei ^a   Murray, Thomas ^a   Wüest, Andrea ^b   Goodwin, Frank ^b   Huh, Sungmin ^b   Cordes, Aaron ^b   Naulleau, Patrick ^c   Goldberg, Kenneth ^c   Mochi, Iacopo ^c   Gullikson, Eric ^c   Denbeaux, Gregory ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b SEMATECH   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

carbon contamination; EUV; mask

Indexed keywords

CARBON CONTAMINATION; CLEANING PROCESS; EUV MASK; EXPERIMENTAL DATA; EXPOSURE TOOL; EXTREME ULTRAVIOLET MASKS; IMAGING PERFORMANCE; LITHOGRAPHIC SIMULATIONS; MULTILAYER SURFACES; POTENTIAL EFFECTS; PRINTED IMAGES;

EXTREME ULTRAVIOLET LITHOGRAPHY; MASKS;

CONTAMINATION;

EID: 77953425668     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846996     Document Type: Conference Paper

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