Resolution enhancement of extreme ultraviolet microscope using an extreme ultraviolet beam splitter

Japanese Journal of Applied Physics

Volumn 47, Issue 6 PART 2, 2008, Pages 4872-4877

  Osugi, Masafumi ^a,c   Tanaka, Kazuumi ^a,c   Sakaya, Noriyuki ^b,c   Hamamoto, Kazuhiro ^b,c   Watanabe, Takeo ^a,c   Kinoshita, Hiroo ^a,c  

^a UNIVERSITY OF HYOGO   (Japan)

^b HOYA CORPORATION   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

EUV beam splitter; EUV microscope; EUVL; Resolution enhancement; Stress control

Indexed keywords

ARGON; ELECTROMAGNETIC WAVES; EXTREME ULTRAVIOLET LITHOGRAPHY; INERT GASES; LASER PULSES; MASKS; MICROSCOPES; MULTILAYERS; OPTICAL INSTRUMENTS; PARTICLE BEAMS; PRISMS;

EUV BEAM SPLITTER; EUV MICROSCOPE; EUVL; RESOLUTION ENHANCEMENT; STRESS CONTROL;

ULTRAVIOLET DEVICES;

EID: 55049141507     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.4872     Document Type: Article

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