High speed actinic EUV mask blank inspection with dark-field imaging

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5446, Issue PART 2, 2004, Pages 804-811

  Terasawa, Tsuneo ^a   Tezuka, Yoshihiro ^a   Ito, Masaaki ^a   Tomie, Toshihisa ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Actinic inspection; At wavelength inspection; EUV; Mask blank; Multilayer; Phase defect

Indexed keywords

CAMERAS; CHARGE COUPLED DEVICES; DATA ACQUISITION; IMAGING TECHNIQUES; INSPECTION; LITHOGRAPHY; MULTILAYERS; OPTIMIZATION;

ACTINIC INSPECTION; AT-WAVELENGTH INSPECTION; EUV; MASK BLANKS; PHASE DEFECTS;

MASKS;

EID: 11844289009     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.557814     Document Type: Conference Paper

References (8)

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