Actinic defect counting statistics over 1 cm2 area of EUVL mask blank

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 431-440

  Jeong, Seongtae ^a   Lai, Chih Wei ^a   Rekawa, Seno ^a   Walton, Chris C ^a   Bokor, Jeffrey ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INSPECTION; LIGHT SCATTERING; MASKS; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0033698631     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)