Status of EUV-lamp development and demonstration of applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 2, 2004, Pages 943-953

  Lebert, Rainer ^a   Wies, Christian ^a   Jägle, Bernhard ^a   Juschkin, Larissa ^a   Bieberle, Ulrich ^a   Meisen, Manfred ^a   Neff, Willi ^b   Bergmann, K ^b   Walter, Konstantin ^b   Rosier, Oliver ^b   Schuermann, Max Christian ^c   Missalla, Thomas ^c  

^a AIXUV GmbH   (Germany)

^b FRAUNHOFER INSTITUTE FOR LASER TECHNOLOGY   (Germany)

^c Jenoptik Mikrotechnik GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COOLING; LIGHT EMISSION; LIGHT SOURCES; MASKS; MIRRORS; RESEARCH AND DEVELOPMENT MANAGEMENT; THIN FILMS; ULTRAVIOLET LAMPS;

BEAMLINES; POWER SCALING; UNIVERSITIES;

LITHOGRAPHY;

EID: 3843129573     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.538058     Document Type: Conference Paper

References (7)

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3. K. Bergmann, G. Schriever, O. Rosier, M. Müller, W. Neff and R. Lebert, Applied Optics 38 (25) (1999) 5413-5417
4. K. Bergmann, O. Rosier, R. Lebert, W. Neff, R. Poprawe, Microelectronic Engineering 57-58 (2001) 71-77
5. M. C. Schuermann, T. Missalla, K. R. Mann, S. Kranzusch, R. M. Klein, F. Scholze, G. Ulm, R. Lebert, L. Juschkin, Proc. SPIE 503Z, 378-388, (2003)
6. K. M. Gaebel, J. Kleinschmidt, G. Schriever, U. Stamm, R. Lebert, M. C. Schuermann, Proc. SPIE 5063, 56-264 (2003)
7. F. Sobel, L. Aschke, Hans W. Becker, M. Renno, F. Ruggeberg, S. Kirchner, T. Leutbecher, N. Olschewski, M. Schiffler, K. Walter, G. Hess, U. Buttgereit, K. Knapp, R. Lebert, L. Juschkin, C. Wies, B. Jaegle, Proc. SPIE 5256, 1259-1270 (2003)