"Actinic-only" defects in extreme ultraviolet lithography mask blanks-native defects at the detection limit of visible-light inspection tools

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4101-4104

  Yi, Moonsuk ^a   Haga, Tsuneyuki ^a   Walton, Chris ^b   Larson, Cindy ^b   Bokor, Jeffrey ^c,d  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b NTT CORPORATION   (Japan)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^d UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Actinic; At wavelength; Defects inspection; Extreme ultraviolet lithography; Mask

Indexed keywords

ACTINIDES; DEFECTS; LIGHT SCATTERING; MASKS; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

MULTILAYERS;

EID: 0036613994     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4101     Document Type: Article

References (9)